Hauptseite > Publikationsdatenbank > Finite element simulations of interdigital electrode structures on high permitivity thin films > RIS |
TY - JOUR AU - Prume, K. AU - Hoffmann, S. AU - Waser, R. TI - Finite element simulations of interdigital electrode structures on high permitivity thin films JO - Integrated ferroelectrics VL - 32 SN - 1058-4587 CY - London [u.a.] PB - Taylor & Francis M1 - PreJuSER-29415 SP - 63 - 72 PY - 2001 N1 - Record converted from VDB: 12.11.2012 LB - PUB:(DE-HGF)16 UR - https://juser.fz-juelich.de/record/29415 ER -