TY  - JOUR
AU  - Thon, A.
AU  - Merschdorf, M.
AU  - Pfeiffer, W.
AU  - Klamroth, T.
AU  - Saalfrank, P.
AU  - Diesing, D.
TI  - Photon-assisted tunneling versus tunneling of excited electrons in metal-insulator-metal junctions
JO  - Applied physics / A
VL  - 78
SN  - 0947-8396
CY  - Berlin
PB  - Springer
M1  - PreJuSER-30244
SP  - 189 - 199
PY  - 2003
N1  - Record converted from VDB: 12.11.2012
AB  - Photocurrent measurements in Ag-Al2O3-Al metal-insulator-metal junctions under illumination with ultra-short laser pulses reveal that tunneling and internal photoemission of excited electrons are the dominating transport mechanisms. Photon-assisted tunneling is observed under rare conditions that depend critically on the preparation of the interface. The comparison of time-resolved two-pulse correlation measurements with model calculations shows that the photon-induced transport of excited electrons is well described using a one-dimensional many-particle model for two coupled metallic leads, whereas a single-particle model for nonresonant excitation in a rectangular double-minimum potential reveals the signature of photon-assisted tunneling.
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000186497500010
DO  - DOI:10.1007/s00339-003-2314-2
UR  - https://juser.fz-juelich.de/record/30244
ER  -