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@ARTICLE{Thon:30244,
author = {Thon, A. and Merschdorf, M. and Pfeiffer, W. and Klamroth,
T. and Saalfrank, P. and Diesing, D.},
title = {{P}hoton-assisted tunneling versus tunneling of excited
electrons in metal-insulator-metal junctions},
journal = {Applied physics / A},
volume = {78},
issn = {0947-8396},
address = {Berlin},
publisher = {Springer},
reportid = {PreJuSER-30244},
pages = {189 - 199},
year = {2003},
note = {Record converted from VDB: 12.11.2012},
abstract = {Photocurrent measurements in Ag-Al2O3-Al
metal-insulator-metal junctions under illumination with
ultra-short laser pulses reveal that tunneling and internal
photoemission of excited electrons are the dominating
transport mechanisms. Photon-assisted tunneling is observed
under rare conditions that depend critically on the
preparation of the interface. The comparison of
time-resolved two-pulse correlation measurements with model
calculations shows that the photon-induced transport of
excited electrons is well described using a one-dimensional
many-particle model for two coupled metallic leads, whereas
a single-particle model for nonresonant excitation in a
rectangular double-minimum potential reveals the signature
of photon-assisted tunneling.},
keywords = {J (WoSType)},
cin = {ISG-3},
ddc = {530},
cid = {I:(DE-Juel1)VDB43},
pnm = {Kondensierte Materie},
pid = {G:(DE-Juel1)FUEK242},
shelfmark = {Materials Science, Multidisciplinary / Physics, Applied},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000186497500010},
doi = {10.1007/s00339-003-2314-2},
url = {https://juser.fz-juelich.de/record/30244},
}