Hauptseite > Publikationsdatenbank > Photon-assisted tunneling versus tunneling of excited electrons in metal-insulator-metal junctions > print |
001 | 30244 | ||
005 | 20180209102025.0 | ||
024 | 7 | _ | |2 DOI |a 10.1007/s00339-003-2314-2 |
024 | 7 | _ | |2 WOS |a WOS:000186497500010 |
024 | 7 | _ | |2 ISSN |a 0947-8396 |
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041 | _ | _ | |a eng |
082 | _ | _ | |a 530 |
084 | _ | _ | |2 WoS |a Materials Science, Multidisciplinary |
084 | _ | _ | |2 WoS |a Physics, Applied |
100 | 1 | _ | |a Thon, A. |b 0 |0 P:(DE-HGF)0 |
245 | _ | _ | |a Photon-assisted tunneling versus tunneling of excited electrons in metal-insulator-metal junctions |
260 | _ | _ | |c 2003 |a Berlin |b Springer |
300 | _ | _ | |a 189 - 199 |
336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
336 | 7 | _ | |a ARTICLE |2 BibTeX |
336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
336 | 7 | _ | |a article |2 DRIVER |
440 | _ | 0 | |a Applied Physics A |x 0947-8396 |0 560 |y 2 |v 78 |
500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
520 | _ | _ | |a Photocurrent measurements in Ag-Al2O3-Al metal-insulator-metal junctions under illumination with ultra-short laser pulses reveal that tunneling and internal photoemission of excited electrons are the dominating transport mechanisms. Photon-assisted tunneling is observed under rare conditions that depend critically on the preparation of the interface. The comparison of time-resolved two-pulse correlation measurements with model calculations shows that the photon-induced transport of excited electrons is well described using a one-dimensional many-particle model for two coupled metallic leads, whereas a single-particle model for nonresonant excitation in a rectangular double-minimum potential reveals the signature of photon-assisted tunneling. |
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588 | _ | _ | |a Dataset connected to Web of Science |
650 | _ | 7 | |a J |2 WoSType |
700 | 1 | _ | |a Merschdorf, M. |b 1 |0 P:(DE-HGF)0 |
700 | 1 | _ | |a Pfeiffer, W. |b 2 |0 P:(DE-HGF)0 |
700 | 1 | _ | |a Klamroth, T. |b 3 |0 P:(DE-HGF)0 |
700 | 1 | _ | |a Saalfrank, P. |b 4 |0 P:(DE-HGF)0 |
700 | 1 | _ | |a Diesing, D. |b 5 |u FZJ |0 P:(DE-Juel1)VDB14258 |
773 | _ | _ | |0 PERI:(DE-600)1398311-8 |a 10.1007/s00339-003-2314-2 |g Vol. 78, p. 189 - 199 |p 189 - 199 |q 78<189 - 199 |t Applied physics / A |v 78 |x 0947-8396 |y 2003 |
856 | 7 | _ | |u http://dx.doi.org/10.1007/s00339-003-2314-2 |
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