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@ARTICLE{Cherepanov:312,
author = {Cherepanov, V. and Voigtländer, B.},
title = {{G}rowth of {A}g on the {B}i-terminated {G}e/{S}i(111)
surface},
journal = {Surface science},
volume = {602},
issn = {0039-6028},
address = {Amsterdam},
publisher = {Elsevier},
reportid = {PreJuSER-312},
pages = {1954 - 1956},
year = {2008},
note = {Record converted from VDB: 12.11.2012},
abstract = {The presence of a Bi layer during Ge epitaxy at the Si(1
11) surface suppresses Si-Ge intermixing and also allows us
to distinguish between Si and Ge in scanning tunneling
microscopy at the atomic level. In our investigation, we
explored the possibility of a selective growth of Ag either
on a Ge area or a Si area. We found that a chemically
selective bonding of Ag to Si or Ge at the prestructured
Ge/Si surface does not occur. Due to the strong passivation
of Si and of the Ge surfaces by a layer of Bi at room and
elevated temperatures Ag collects into 3D islands without
being incorporated into the surface. Co-deposition of Ag
during the epitaxy of Ge on the Bi-terminated Si(1 11)
surface also leads to an accumulation of Ag into 3D islands,
while the remaining surface is covered by a layer of Bi. (c)
2008 Elsevier B.V. All rights reserved.},
keywords = {J (WoSType)},
cin = {IBN-3 / CNI / JARA-FIT},
ddc = {540},
cid = {I:(DE-Juel1)VDB801 / I:(DE-Juel1)VDB381 /
$I:(DE-82)080009_20140620$},
pnm = {Grundlagen für zukünftige Informationstechnologien},
pid = {G:(DE-Juel1)FUEK412},
shelfmark = {Chemistry, Physical / Physics, Condensed Matter},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000256980200007},
doi = {10.1016/j.susc.2008.03.045},
url = {https://juser.fz-juelich.de/record/312},
}