000032000 001__ 32000
000032000 005__ 20200423203543.0
000032000 017__ $$aThis version is available at the following Publisher URL: http://rsi.aip.org
000032000 0247_ $$2DOI$$a10.1063/1.1544415
000032000 0247_ $$2WOS$$aWOS:000181829000053
000032000 0247_ $$2Handle$$a2128/1238
000032000 037__ $$aPreJuSER-32000
000032000 041__ $$aeng
000032000 082__ $$a530
000032000 084__ $$2WoS$$aInstruments & Instrumentation
000032000 084__ $$2WoS$$aPhysics, Applied
000032000 1001_ $$0P:(DE-HGF)0$$aGerber, P.$$b0
000032000 245__ $$aShort-time piezoelectric measurements in ferroelectric thin films using a double-beam laser interferometer
000032000 260__ $$a[S.l.]$$bAmerican Institute of Physics$$c2003
000032000 300__ $$a2613 - 2615
000032000 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article
000032000 3367_ $$2DataCite$$aOutput Types/Journal article
000032000 3367_ $$00$$2EndNote$$aJournal Article
000032000 3367_ $$2BibTeX$$aARTICLE
000032000 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000032000 3367_ $$2DRIVER$$aarticle
000032000 440_0 $$05309$$aReview of Scientific Instruments$$v74$$x0034-6748
000032000 500__ $$aRecord converted from VDB: 12.11.2012
000032000 520__ $$aAn evolution of the double-beam laser interferometer used for piezoelectric measurements in ferroelectric thin films is reported. Measuring the d(33) hysteresis of a ferroelectric material using lock-in technique with large time constants requires a varying bias field to be applied to the sample over a long period of time. This long-term application leads to electrical stress during the measurement. We present a measurement technique using a different source for the applied field and a varied method for averaging the interferometric response. The measurement time for a complete d(33) hysteresis will be shortened down to several seconds. Also, the cycle frequency becomes comparable to electrical hysteresis measurements. Experimental results on quartz and Pb(Zr-(X),Ti(1-X))O-3 are given to demonstrate the capabilities of the interferometer and the new measurement method. (C) 2003 American Institute of Physics.
000032000 536__ $$0G:(DE-Juel1)FUEK252$$2G:(DE-HGF)$$aMaterialien, Prozesse und Bauelemente für die  Mikro- und Nanoelektronik$$cI01$$x0
000032000 588__ $$aDataset connected to Web of Science
000032000 650_7 $$2WoSType$$aJ
000032000 7001_ $$0P:(DE-HGF)0$$aRoelofs, A.$$b1
000032000 7001_ $$0P:(DE-HGF)0$$aLohse, O.$$b2
000032000 7001_ $$0P:(DE-HGF)0$$aKügeler, C.$$b3
000032000 7001_ $$0P:(DE-HGF)0$$aTiedke, S.$$b4
000032000 7001_ $$0P:(DE-HGF)0$$aBöttger, U.$$b5
000032000 7001_ $$0P:(DE-Juel1)131022$$aWaser, R.$$b6$$uFZJ
000032000 773__ $$0PERI:(DE-600)1472905-2$$a10.1063/1.1544415$$gVol. 74, p. 2613 - 2615$$p2613 - 2615$$q74<2613 - 2615$$tReview of scientific instruments$$v74$$x0034-6748$$y2003
000032000 8567_ $$uhttp://hdl.handle.net/2128/1238$$uhttp://dx.doi.org/10.1063/1.1544415
000032000 8564_ $$uhttps://juser.fz-juelich.de/record/32000/files/33401.pdf$$yOpenAccess
000032000 8564_ $$uhttps://juser.fz-juelich.de/record/32000/files/33401.jpg?subformat=icon-1440$$xicon-1440$$yOpenAccess
000032000 8564_ $$uhttps://juser.fz-juelich.de/record/32000/files/33401.jpg?subformat=icon-180$$xicon-180$$yOpenAccess
000032000 8564_ $$uhttps://juser.fz-juelich.de/record/32000/files/33401.jpg?subformat=icon-640$$xicon-640$$yOpenAccess
000032000 909CO $$ooai:juser.fz-juelich.de:32000$$pdnbdelivery$$pVDB$$pdriver$$popen_access$$popenaire
000032000 9131_ $$0G:(DE-Juel1)FUEK252$$bInformation$$kI01$$lInformationstechnologie mit nanoelektronischen Systemen$$vMaterialien, Prozesse und Bauelemente für die  Mikro- und Nanoelektronik$$x0
000032000 9141_ $$y2003
000032000 915__ $$0StatID:(DE-HGF)0010$$aJCR/ISI refereed
000032000 915__ $$0StatID:(DE-HGF)0510$$2StatID$$aOpenAccess
000032000 9201_ $$0I:(DE-Juel1)VDB35$$d31.12.2003$$gIFF$$kIFF-EKM$$lElektrokeramische Materialien$$x0
000032000 970__ $$aVDB:(DE-Juel1)33401
000032000 980__ $$aVDB
000032000 980__ $$aJUWEL
000032000 980__ $$aConvertedRecord
000032000 980__ $$ajournal
000032000 980__ $$aI:(DE-Juel1)PGI-7-20110106
000032000 980__ $$aUNRESTRICTED
000032000 980__ $$aFullTexts
000032000 9801_ $$aFullTexts
000032000 981__ $$aI:(DE-Juel1)PGI-7-20110106