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017 _ _ |a This version is available at the following Publisher URL: http://rsi.aip.org
024 7 _ |a 10.1063/1.1544415
|2 DOI
024 7 _ |a WOS:000181829000053
|2 WOS
024 7 _ |a 2128/1238
|2 Handle
037 _ _ |a PreJuSER-32000
041 _ _ |a eng
082 _ _ |a 530
084 _ _ |2 WoS
|a Instruments & Instrumentation
084 _ _ |2 WoS
|a Physics, Applied
100 1 _ |a Gerber, P.
|b 0
|0 P:(DE-HGF)0
245 _ _ |a Short-time piezoelectric measurements in ferroelectric thin films using a double-beam laser interferometer
260 _ _ |a [S.l.]
|b American Institute of Physics
|c 2003
300 _ _ |a 2613 - 2615
336 7 _ |a Journal Article
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336 7 _ |a Journal Article
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336 7 _ |a ARTICLE
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336 7 _ |a JOURNAL_ARTICLE
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336 7 _ |a article
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440 _ 0 |a Review of Scientific Instruments
|x 0034-6748
|0 5309
|v 74
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a An evolution of the double-beam laser interferometer used for piezoelectric measurements in ferroelectric thin films is reported. Measuring the d(33) hysteresis of a ferroelectric material using lock-in technique with large time constants requires a varying bias field to be applied to the sample over a long period of time. This long-term application leads to electrical stress during the measurement. We present a measurement technique using a different source for the applied field and a varied method for averaging the interferometric response. The measurement time for a complete d(33) hysteresis will be shortened down to several seconds. Also, the cycle frequency becomes comparable to electrical hysteresis measurements. Experimental results on quartz and Pb(Zr-(X),Ti(1-X))O-3 are given to demonstrate the capabilities of the interferometer and the new measurement method. (C) 2003 American Institute of Physics.
536 _ _ |a Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
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700 1 _ |a Roelofs, A.
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700 1 _ |a Lohse, O.
|b 2
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700 1 _ |a Kügeler, C.
|b 3
|0 P:(DE-HGF)0
700 1 _ |a Tiedke, S.
|b 4
|0 P:(DE-HGF)0
700 1 _ |a Böttger, U.
|b 5
|0 P:(DE-HGF)0
700 1 _ |a Waser, R.
|b 6
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773 _ _ |a 10.1063/1.1544415
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856 7 _ |u http://dx.doi.org/10.1063/1.1544415
|u http://hdl.handle.net/2128/1238
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920 1 _ |k IFF-EKM
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|d 31.12.2003
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