TY  - JOUR
AU  - Regnery, S.
AU  - Ehrhart, P.
AU  - Fitsilis, F.
AU  - Waser, R.
AU  - Ding, Y.
AU  - Jia, C. L.
AU  - Schumacher, M.
AU  - Schienle, F.
TI  - (Ba,Sr)TiO3 thin film growth in a batch processing MOCVD reactor
JO  - Journal of the European Ceramic Society
VL  - 24
SN  - 0955-2219
CY  - Amsterdam [u.a.]
PB  - Elsevier Science
M1  - PreJuSER-32025
SP  - 271-276
PY  - 2003
N1  - Record converted from VDB: 12.11.2012
AB  - Thin films of different compositions within the (Ba-x,Sr1-x)TiO3 solid solution series were deposited in a planetary multi-wafer MOCVD reactor using different solutions of Sr(thd)(2), Ba(thd)(2) and Ti(O-i-Pr)(2)(thd)(2) precursors. Structural and electrical properties of Pt/BST/Pt MIM structures are presented. On the base of film thickness series ranging from 10 to 150 nm the electrical permittivity is discussed within the dead layer model. The performance of two different liquid precursor delivery systems, characterized by flash evaporation and liquid injection, respectively, are compared for the example of different SrTiO3 films. Finally, the growth of SrTiO3 on Pt(111) is compared with the growth on Si(100) and the electrical characteristics of the Pt/STO/Si MIS structures are discussed. (C) 2003 Elsevier Ltd. All rights reserved.
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000186348500017
DO  - DOI:10.1016/S0955-2219(03)00235-8
UR  - https://juser.fz-juelich.de/record/32025
ER  -