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@ARTICLE{Schmitz:32044,
author = {Schmitz, S. and Schroeder, H.},
title = {{L}eakage current measurements of {STO} and {BST} thin
films interpreted by the 'dead' layer model},
journal = {Integrated ferroelectrics},
volume = {46},
issn = {1058-4587},
address = {London [u.a.]},
publisher = {Taylor $\&$ Francis},
reportid = {PreJuSER-32044},
pages = {233},
year = {2002},
note = {Record converted from VDB: 12.11.2012},
abstract = {Electrical properties of Strontium-Titanate (STO) and
Barium-Strontium-Titanate (BST) thin films capacitors were
investigated. The STO films were fabricated by chemical
solution deposition (CSD) with thickness between 50 and 150
nm, while the BST films were deposited by metal organic
chemical vapor deposition (MOCVD) with thickness between 20
and 110 nm. All films were grown on platinized and oxidized
silicon wafers. As top electrodes platinum (Pt) was
deposited on top of the ceramic film by sputtering. The
electrode size varied between 8*10(-3) to 1 mm(2) . The
leakage current measurements were performed at different
temperatures ranging from 15 to 200degreesC and the applied
voltage varied between 0 and +/-4 V. Capacitance was
measured at RT up to +/-3 V bias at 1 kHz and 50 mV
oscillation voltage.The main results are: The effective
barrier heights extracted from the temperature dependence of
leakage current are about 1.35 eV for STO and 0.94 eV for
BST for the temperature region >100degreesC. The field
dependencies of the leakage current show almost perfect
linear behavior in a "Schottky" plot for BST while STO
reveals 2 separated Schottky regions. The permittivity
extracted from the field dependence using the simple
thermionic emission model with Schottky lowering results in
rather improbable values of the effective Richardson
constant A(*) and unphysical values of the relative optical
permittivity, epsilon(r,opt) <1.The use of a modified model
with low permittivity interface layers ("dead layers"), as
suggested by the thickness dependence of the inverse
capacitance, solved these difficulties. The parameters
extracted from fits of this model are discussed.},
keywords = {J (WoSType)},
cin = {IFF-EKM},
ddc = {620},
cid = {I:(DE-Juel1)VDB35},
pnm = {Materialien, Prozesse und Bauelemente für die Mikro- und
Nanoelektronik},
pid = {G:(DE-Juel1)FUEK252},
shelfmark = {Engineering, Electrical $\&$ Electronic / Physics, Applied
/ Physics, Condensed Matter},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000179828900026},
doi = {10.1080/10584580190044371},
url = {https://juser.fz-juelich.de/record/32044},
}