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@ARTICLE{Mrquez:32204,
      author       = {Márquez, K. and Oritz, R. and Schultze, J. W. and
                      Márquez, O. P. and Staikov, G.},
      title        = {{I}n {S}itu {FTIR} {M}onitoring of {A}g and {A}u
                      {E}lectrodeposition on {G}lassy {C}arbon and {S}ilicon},
      journal      = {Electrochimica acta},
      volume       = {48},
      issn         = {0013-4686},
      address      = {New York, NY [u.a.]},
      publisher    = {Elsevier},
      reportid     = {PreJuSER-32204},
      pages        = {711 - 720},
      year         = {2003},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {Formation of Ag, Au and Ag-Au alloys on Si and Glassy
                      Carbon (GC) electrodes from alkaline cyanide electrolytes
                      was investigated using a combination of electrochemical and
                      spectroscopic techniques. Metal deposition and dissolution
                      processes could be studied in situ by monitoring the v(CN)
                      bands of the metal complexes and the, free cyanide ion in
                      the region between 2000 and 2200 cm(-1) using FTIR
                      reflectance spectroscopy. Under the experimental conditions,
                      two different silver complexes, namely [Ag(CN)(2)](-) and
                      [Ag(CN)(3)](2-) (whilst only one gold complex, namely
                      [Au(CN)(2)](-)), were identified. In the case of the Ag-Au
                      alloys, both species co-deposit even in the activation
                      region, where Ag reduction is expected to be the main
                      reaction. Experimental results indicate that in a mixed
                      electrolyte containing equal amounts of Ag and Au, Ag
                      deposition is thermodynamically favoured ( E-eq(0),
                      (Ag)>E-eq(0), (Au)), while Au deposition is kinetically
                      favoured. The Ag-Au alloy deposition follows a progressive
                      nucleation mechanism even at relatively high negative
                      potentials. The morphology and adhesion of all deposits, as
                      well as the alloy composition, were found to be strongly
                      dependent on the deposition conditions. A better adhesion of
                      the films with a higher Au content was observed, due to the
                      formation of a more stable Au-Si bond. (C) 2002 Elsevier
                      Science Ltd. All rights reserved.},
      keywords     = {J (WoSType)},
      cin          = {ISG-3},
      ddc          = {540},
      cid          = {I:(DE-Juel1)VDB43},
      pnm          = {Materialien, Prozesse und Bauelemente für die Mikro- und
                      Nanoelektronik},
      pid          = {G:(DE-Juel1)FUEK252},
      shelfmark    = {Electrochemistry},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000180995600010},
      doi          = {10.1016/S0013-4686(02)00740-5},
      url          = {https://juser.fz-juelich.de/record/32204},
}