001     32204
005     20190625111330.0
024 7 _ |2 DOI
|a 10.1016/S0013-4686(02)00740-5
024 7 _ |2 WOS
|a WOS:000180995600010
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037 _ _ |a PreJuSER-32204
041 _ _ |a eng
082 _ _ |a 540
084 _ _ |2 WoS
|a Electrochemistry
100 1 _ |a Márquez, K.
|b 0
|0 P:(DE-HGF)0
245 _ _ |a In Situ FTIR Monitoring of Ag and Au Electrodeposition on Glassy Carbon and Silicon
260 _ _ |a New York, NY [u.a.]
|b Elsevier
|c 2003
300 _ _ |a 711 - 720
336 7 _ |a Journal Article
|0 PUB:(DE-HGF)16
|2 PUB:(DE-HGF)
336 7 _ |a Output Types/Journal article
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336 7 _ |a Journal Article
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336 7 _ |a ARTICLE
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336 7 _ |a JOURNAL_ARTICLE
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336 7 _ |a article
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440 _ 0 |a Electrochimica Acta
|x 0013-4686
|0 1776
|y 6
|v 48
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a Formation of Ag, Au and Ag-Au alloys on Si and Glassy Carbon (GC) electrodes from alkaline cyanide electrolytes was investigated using a combination of electrochemical and spectroscopic techniques. Metal deposition and dissolution processes could be studied in situ by monitoring the v(CN) bands of the metal complexes and the, free cyanide ion in the region between 2000 and 2200 cm(-1) using FTIR reflectance spectroscopy. Under the experimental conditions, two different silver complexes, namely [Ag(CN)(2)](-) and [Ag(CN)(3)](2-) (whilst only one gold complex, namely [Au(CN)(2)](-)), were identified. In the case of the Ag-Au alloys, both species co-deposit even in the activation region, where Ag reduction is expected to be the main reaction. Experimental results indicate that in a mixed electrolyte containing equal amounts of Ag and Au, Ag deposition is thermodynamically favoured ( E-eq(0), (Ag)>E-eq(0), (Au)), while Au deposition is kinetically favoured. The Ag-Au alloy deposition follows a progressive nucleation mechanism even at relatively high negative potentials. The morphology and adhesion of all deposits, as well as the alloy composition, were found to be strongly dependent on the deposition conditions. A better adhesion of the films with a higher Au content was observed, due to the formation of a more stable Au-Si bond. (C) 2002 Elsevier Science Ltd. All rights reserved.
536 _ _ |a Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
|c I01
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588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
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653 2 0 |2 Author
|a electrodeposition
653 2 0 |2 Author
|a FTIR
653 2 0 |2 Author
|a silver
653 2 0 |2 Author
|a gold
653 2 0 |2 Author
|a silicon
653 2 0 |2 Author
|a glassy carbon
653 2 0 |2 Author
|a alloys
700 1 _ |a Oritz, R.
|b 1
|0 P:(DE-HGF)0
700 1 _ |a Schultze, J. W.
|b 2
|0 P:(DE-HGF)0
700 1 _ |a Márquez, O. P.
|b 3
|0 P:(DE-HGF)0
700 1 _ |a Staikov, G.
|b 4
|u FZJ
|0 P:(DE-Juel1)VDB13645
773 _ _ |a 10.1016/S0013-4686(02)00740-5
|g Vol. 48, p. 711 - 720
|p 711 - 720
|q 48<711 - 720
|0 PERI:(DE-600)1483548-4
|t Electrochimica acta
|v 48
|y 2003
|x 0013-4686
856 7 _ |u http://dx.doi.org/10.1016/S0013-4686(02)00740-5
909 C O |o oai:juser.fz-juelich.de:32204
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913 1 _ |k I01
|v Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
|l Informationstechnologie mit nanoelektronischen Systemen
|b Information
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|x 0
914 1 _ |y 2003
915 _ _ |0 StatID:(DE-HGF)0010
|a JCR/ISI refereed
920 1 _ |k ISG-3
|l Institut für Grenzflächen und Vakuumtechnologien
|d 31.12.2006
|g ISG
|0 I:(DE-Juel1)VDB43
|x 0
970 _ _ |a VDB:(DE-Juel1)34030
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980 _ _ |a UNRESTRICTED
981 _ _ |a I:(DE-Juel1)PGI-3-20110106


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