001     32209
005     20180210134057.0
024 7 _ |2 DOI
|a 10.1007/s10008-003-0426-4
024 7 _ |2 WOS
|a WOS:000188495500011
037 _ _ |a PreJuSER-32209
041 _ _ |a eng
082 _ _ |a 540
084 _ _ |2 WoS
|a Electrochemistry
100 1 _ |a Mai, T. T.
|b 0
|0 P:(DE-HGF)0
245 _ _ |a Relation between Surface Preconditioning and Metal Deposition in Direct Galvanic Metallization of Insulating Surfaces
260 _ _ |a Berlin
|b Springer
|c 2004
300 _ _ |a 201
336 7 _ |a Journal Article
|0 PUB:(DE-HGF)16
|2 PUB:(DE-HGF)
336 7 _ |a Output Types/Journal article
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336 7 _ |a Journal Article
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336 7 _ |a ARTICLE
|2 BibTeX
336 7 _ |a JOURNAL_ARTICLE
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336 7 _ |a article
|2 DRIVER
440 _ 0 |a Journal of Solid State Electrochemistry
|x 1432-8488
|0 12701
|v 8
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a The relation between surface preconditioning and metal deposition in the direct galvanic metallization of different insulating polymer surfaces by the so-called PLATO technique was studied using electrochemical and surface analytical methods. AFM, XPS and contact angle measurements show that the chromic acid etching of original polymer surfaces leads to an increase of the surface energy and hydrophilicity of polymer substrates due to both surface roughening and the formation of -COOH and/or -COH surface groups. However, decisive for the subsequent surface activation with cobalt sulfide is the increase in surface roughness. The influence of the degree of activation and the electrode potential on the kinetics of Ni metallization was studied by current transient measurements on activated line-shaped structures. The results suggest that the electrochemical reduction of cobalt sulfide to cobalt is a necessary step to induce the process of Ni electrodeposition. Successful Ni metallization could be obtained on ABS (acrylonitrile-butadiene-styrene) and PEEK (poly-ether-ether-ketone) surfaces. The lateral propagation rate, V-x, of the depositing Ni layer depends exponentially on the applied potential and was found to be several orders of magnitude higher than the Ni deposition rate, V-z, in the normal z-direction (V-x/V-z=10(2)-10(4)). It was demonstrated that the approach involving cobalt sulfide pre-activation can also be applied successfully for metallization of oxidized porous silicon surfaces.
536 _ _ |a Kondensierte Materie
|c M02
|2 G:(DE-HGF)
|0 G:(DE-Juel1)FUEK242
|x 0
588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
|2 WoSType
653 2 0 |2 Author
|a cobalt sulfide
653 2 0 |2 Author
|a electrodeposition
653 2 0 |2 Author
|a insulating polymers
653 2 0 |2 Author
|a metallization
653 2 0 |2 Author
|a X-ray photoelectron spectroscopy
700 1 _ |a Schultze, J. W.
|b 1
|0 P:(DE-HGF)0
700 1 _ |a Staikov, G.
|b 2
|u FZJ
|0 P:(DE-Juel1)VDB13645
773 _ _ |a 10.1007/s10008-003-0426-4
|g Vol. 8, p. 201
|p 201
|q 8<201
|0 PERI:(DE-600)1478940-1
|t Journal of solid state electrochemistry
|v 8
|y 2004
|x 1432-8488
856 7 _ |u http://dx.doi.org/10.1007/s10008-003-0426-4
909 C O |o oai:juser.fz-juelich.de:32209
|p VDB
913 1 _ |k M02
|v Kondensierte Materie
|l Kondensierte Materie
|b Materie
|0 G:(DE-Juel1)FUEK242
|x 0
914 1 _ |a Nachtrag
|y 2004
915 _ _ |0 StatID:(DE-HGF)0010
|a JCR/ISI refereed
920 1 _ |k ISG-3
|l Institut für Grenzflächen und Vakuumtechnologien
|d 31.12.2006
|g ISG
|0 I:(DE-Juel1)VDB43
|x 0
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980 _ _ |a journal
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980 _ _ |a UNRESTRICTED
981 _ _ |a I:(DE-Juel1)PGI-3-20110106


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