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000003295 084__ $$2WoS$$aChemistry, Physical
000003295 084__ $$2WoS$$aMaterials Science, Coatings & Films
000003295 084__ $$2WoS$$aPhysics, Applied
000003295 084__ $$2WoS$$aPhysics, Condensed Matter
000003295 1001_ $$0P:(DE-Juel1)VDB9870$$aPodgurski, V.$$b0$$uFZJ
000003295 245__ $$aUltra thin Al2O3films grown on Ni3Al(100)
000003295 260__ $$aAmsterdam$$bNorth-Holland$$c2003
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000003295 520__ $$aThe oxidation of the Ni3Al(1 0 0) surface at 1100 K with 2000 1 was investigated by Auger electron spectroscopy (AES), low energy electron diffraction (LEED), high resolution electron energy loss spectroscopy (EELS), and scanning tunneling microscopy (STM). Oxidation at 1100 K, leads to the formation of a well ordered, ultra thin Al2O3 film on top of Ni3Al(1 0 0). The oxide grows with the (1 1 1) plane of the gamma'-Al2O3 parallel to the surface plane of the substrate. The observed LEED pattern of the Al2O3 film is explained by a hexagonal structure in two domains which are perpendicularly oriented with respect to each other. The lattice constant of the hexagonal structure amounts to similar to3 Angstrom. In addition, two hexagonal superstructures with a lattice constant of 17.5 and 54 Angstrom were found on the oxide surface. (C) 2002 Published by Elsevier Science B.V.
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000003295 65320 $$2Author$$aintermetallic alloys
000003295 65320 $$2Author$$aoxidation
000003295 65320 $$2Author$$aNi3Al
000003295 65320 $$2Author$$aAl2O3
000003295 65320 $$2Author$$aAuger electron spectroscopy
000003295 65320 $$2Author$$ascanning tunneling microscopy
000003295 65320 $$2Author$$alow energy electron diffraction
000003295 65320 $$2Author$$ahigh-resolution electron energy loss spectroscopy
000003295 7001_ $$0P:(DE-Juel1)VDB5492$$aCostina, I.$$b1$$uFZJ
000003295 7001_ $$0P:(DE-Juel1)VDB5400$$aFranchy, R.$$b2$$uFZJ
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000003295 8567_ $$uhttp://dx.doi.org/10.1016/S0169-4332(02)00802-4
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000003295 9201_ $$0I:(DE-Juel1)VDB43$$d31.12.2006$$gISG$$kISG-3$$lInstitut für Grenzflächen und Vakuumtechnologien$$x0
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