001     3298
005     20180208222638.0
024 7 _ |2 DOI
|a 10.1016/S0039-6028(03)00081-5
024 7 _ |2 WOS
|a WOS:000182192500022
037 _ _ |a PreJuSER-3298
041 _ _ |a eng
082 _ _ |a 540
084 _ _ |2 WoS
|a Chemistry, Physical
084 _ _ |2 WoS
|a Physics, Condensed Matter
100 1 _ |a Podgursky, E. G.
|b 0
|u FZJ
|0 P:(DE-Juel1)VDB9876
245 _ _ |a Co on thin Al2O3 films grown on Ni3Al(100)
260 _ _ |a Amsterdam
|b Elsevier
|c 2003
300 _ _ |a 419
336 7 _ |a Journal Article
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336 7 _ |a JOURNAL_ARTICLE
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336 7 _ |a article
|2 DRIVER
440 _ 0 |a Surface Science
|x 0039-6028
|0 5673
|v 529
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a The growth of Co on thin Al2O3 layers on Ni3Al(1 0 0) was investigated by Auger electron spectroscopy, high resolution electron energy loss spectroscopy (EELS), and scanning tunneling microscopy. At 300 K, Co grows in three-dimensional clusters on top of the Al2O3 layer. A defect structure of the alumina layer plays a crucial role during the early stage of Co growth. After deposition of 10 Angstrom of Co, a complete screening of the dipoles of the Al2O3 layer due to the Co film is found in the EELS measurements. Annealing the Co film reveals a process of coalescence of Co clusters and, above 700 K, diffusion of the Co atoms through the oxide film into the substrate takes place. (C) 2003 Elsevier Science B.V. All rights reserved.
536 _ _ |a Kondensierte Materie
|c M02
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588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
|2 WoSType
653 2 0 |2 Author
|a cobalt
653 2 0 |2 Author
|a aluminum oxide
653 2 0 |2 Author
|a surface defects
653 2 0 |2 Author
|a surface diffusion
653 2 0 |2 Author
|a growth
653 2 0 |2 Author
|a clusters
653 2 0 |2 Author
|a Auger electron spectroscopy
653 2 0 |2 Author
|a scanning tunneling microscopy
653 2 0 |2 Author
|a electron energy loss spectroscopy (EELS)
700 1 _ |a Costina, I.
|b 1
|u FZJ
|0 P:(DE-Juel1)VDB5492
700 1 _ |a Franchy, R.
|b 2
|u FZJ
|0 P:(DE-Juel1)VDB5400
773 _ _ |a 10.1016/S0039-6028(03)00081-5
|g Vol. 529, p. 419
|p 419
|q 529<419
|0 PERI:(DE-600)1479030-0
|t Surface science
|v 529
|y 2003
|x 0039-6028
856 7 _ |u http://dx.doi.org/10.1016/S0039-6028(03)00081-5
909 C O |o oai:juser.fz-juelich.de:3298
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913 1 _ |k M02
|v Kondensierte Materie
|l Kondensierte Materie
|b Materie
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914 1 _ |y 2003
915 _ _ |0 StatID:(DE-HGF)0010
|a JCR/ISI refereed
920 1 _ |k ISG-3
|l Institut für Grenzflächen und Vakuumtechnologien
|d 31.12.2006
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