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@ARTICLE{Meier:3365,
author = {Meier, M. and Schindler, C. and Gilles, S. and Rosezin, R.
and Rüdiger, A. and Kügeler, C. and Waser, R.},
title = {{A} nonvolatile memory with resistively switching
methyl-silsesquioxane},
journal = {IEEE Electron Device Letters},
volume = {30},
issn = {0741-3106},
address = {New York, NY},
publisher = {IEEE},
reportid = {PreJuSER-3365},
pages = {8 - 10},
year = {2009},
note = {Record converted from VDB: 12.11.2012},
abstract = {Crossbar structures with integrated methyl-silsesquioxane
(MSQ) were fabricated by UV nanoimprint lithography. The
sandwiched MSQ film was used for the planarization of the
bottom electrodes' interface as well as for the realization
of functional resistively switching crosspoint junctions.
With our process, future nonvolatile crossbar memories with
stacking and, thus, high integration density potential can
be realized. Using MSQ as functional material additionally
indicates an attractive opportunity because it is highly
CMOS compatible. By programming word registers with
different bit patterns, we demonstrate the potential of this
crossbar architecture for future memory and logic
applications.},
keywords = {J (WoSType)},
cin = {IBN-2 / IFF-6 / JARA-FIT},
ddc = {620},
cid = {I:(DE-Juel1)IBN-2-20090406 / I:(DE-Juel1)VDB786 /
$I:(DE-82)080009_20140620$},
pnm = {Grundlagen für zukünftige Informationstechnologien},
pid = {G:(DE-Juel1)FUEK412},
shelfmark = {Engineering, Electrical $\&$ Electronic},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000262364200004},
doi = {10.1109/LED.2008.2008108},
url = {https://juser.fz-juelich.de/record/3365},
}