%0 Journal Article
%A Kluth, O.
%A Schöpe, G.
%A Hüpkes, J.
%A Agashe, Ch.
%A Müller, J.
%A Rech, B.
%T Modified Thornton model for magnetron sputtered zinc oxide: film structure and etching behaviour
%J Thin solid films
%V 442
%@ 0040-6090
%C Amsterdam [u.a.]
%I Elsevier
%M PreJuSER-33962
%P 80 - 85
%D 2003
%Z Record converted from VDB: 12.11.2012
%X ZnO:Al films were prepared on glass substrates with different sputter techniques from ceramic ZnO:Al2O3 target as well as metallic Zn:Al targets using a wide range of deposition parameters. Independent of the sputter technique, sputter pressure and substrate temperature were found to have a major influence on the electrical and structural properties of the ZnO:Al films. With an increasing deposition pressure, we observed a strong decrease in the carrier mobility and also an increase of the etching rate. The surface morphology obtAlned after etching of RF sputtered ZnO:Al systematically changes from crater-like to hill-like surface appearance with increasing pressure. The correlation of sputter parameters, film growth and structural properties is discussed in terms of a modified Thornton model. (C) 2003 Elsevier Science B.V. All rights reserved.
%K J (WoSType)
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000185656200018
%R 10.1016/S0040-6090(03)00949-0
%U https://juser.fz-juelich.de/record/33962