TY  - JOUR
AU  - Kluth, O.
AU  - Schöpe, G.
AU  - Hüpkes, J.
AU  - Agashe, Ch.
AU  - Müller, J.
AU  - Rech, B.
TI  - Modified Thornton model for magnetron sputtered zinc oxide: film structure and etching behaviour
JO  - Thin solid films
VL  - 442
SN  - 0040-6090
CY  - Amsterdam [u.a.]
PB  - Elsevier
M1  - PreJuSER-33962
SP  - 80 - 85
PY  - 2003
N1  - Record converted from VDB: 12.11.2012
AB  - ZnO:Al films were prepared on glass substrates with different sputter techniques from ceramic ZnO:Al2O3 target as well as metallic Zn:Al targets using a wide range of deposition parameters. Independent of the sputter technique, sputter pressure and substrate temperature were found to have a major influence on the electrical and structural properties of the ZnO:Al films. With an increasing deposition pressure, we observed a strong decrease in the carrier mobility and also an increase of the etching rate. The surface morphology obtAlned after etching of RF sputtered ZnO:Al systematically changes from crater-like to hill-like surface appearance with increasing pressure. The correlation of sputter parameters, film growth and structural properties is discussed in terms of a modified Thornton model. (C) 2003 Elsevier Science B.V. All rights reserved.
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000185656200018
DO  - DOI:10.1016/S0040-6090(03)00949-0
UR  - https://juser.fz-juelich.de/record/33962
ER  -