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@ARTICLE{Kluth:33962,
      author       = {Kluth, O. and Schöpe, G. and Hüpkes, J. and Agashe, Ch.
                      and Müller, J. and Rech, B.},
      title        = {{M}odified {T}hornton model for magnetron sputtered zinc
                      oxide: film structure and etching behaviour},
      journal      = {Thin solid films},
      volume       = {442},
      issn         = {0040-6090},
      address      = {Amsterdam [u.a.]},
      publisher    = {Elsevier},
      reportid     = {PreJuSER-33962},
      pages        = {80 - 85},
      year         = {2003},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {ZnO:Al films were prepared on glass substrates with
                      different sputter techniques from ceramic ZnO:Al2O3 target
                      as well as metallic Zn:Al targets using a wide range of
                      deposition parameters. Independent of the sputter technique,
                      sputter pressure and substrate temperature were found to
                      have a major influence on the electrical and structural
                      properties of the ZnO:Al films. With an increasing
                      deposition pressure, we observed a strong decrease in the
                      carrier mobility and also an increase of the etching rate.
                      The surface morphology obtAlned after etching of RF
                      sputtered ZnO:Al systematically changes from crater-like to
                      hill-like surface appearance with increasing pressure. The
                      correlation of sputter parameters, film growth and
                      structural properties is discussed in terms of a modified
                      Thornton model. (C) 2003 Elsevier Science B.V. All rights
                      reserved.},
      keywords     = {J (WoSType)},
      cin          = {IPV},
      ddc          = {070},
      cid          = {I:(DE-Juel1)VDB46},
      pnm          = {Photovoltaik},
      pid          = {G:(DE-Juel1)FUEK247},
      shelfmark    = {Materials Science, Multidisciplinary / Materials Science,
                      Coatings $\&$ Films / Physics, Applied / Physics, Condensed
                      Matter},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000185656200018},
      doi          = {10.1016/S0040-6090(03)00949-0},
      url          = {https://juser.fz-juelich.de/record/33962},
}