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| 001 | 33962 | ||
| 005 | 20240708133637.0 | ||
| 024 | 7 | _ | |2 DOI |a 10.1016/S0040-6090(03)00949-0 |
| 024 | 7 | _ | |2 WOS |a WOS:000185656200018 |
| 024 | 7 | _ | |a altmetric:241303 |2 altmetric |
| 037 | _ | _ | |a PreJuSER-33962 |
| 041 | _ | _ | |a eng |
| 082 | _ | _ | |a 070 |
| 084 | _ | _ | |2 WoS |a Materials Science, Multidisciplinary |
| 084 | _ | _ | |2 WoS |a Materials Science, Coatings & Films |
| 084 | _ | _ | |2 WoS |a Physics, Applied |
| 084 | _ | _ | |2 WoS |a Physics, Condensed Matter |
| 100 | 1 | _ | |a Kluth, O. |b 0 |u FZJ |0 P:(DE-Juel1)VDB5913 |
| 245 | _ | _ | |a Modified Thornton model for magnetron sputtered zinc oxide: film structure and etching behaviour |
| 260 | _ | _ | |a Amsterdam [u.a.] |b Elsevier |c 2003 |
| 300 | _ | _ | |a 80 - 85 |
| 336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a article |2 DRIVER |
| 440 | _ | 0 | |a Thin Solid Films |x 0040-6090 |0 5762 |v 442 |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 520 | _ | _ | |a ZnO:Al films were prepared on glass substrates with different sputter techniques from ceramic ZnO:Al2O3 target as well as metallic Zn:Al targets using a wide range of deposition parameters. Independent of the sputter technique, sputter pressure and substrate temperature were found to have a major influence on the electrical and structural properties of the ZnO:Al films. With an increasing deposition pressure, we observed a strong decrease in the carrier mobility and also an increase of the etching rate. The surface morphology obtAlned after etching of RF sputtered ZnO:Al systematically changes from crater-like to hill-like surface appearance with increasing pressure. The correlation of sputter parameters, film growth and structural properties is discussed in terms of a modified Thornton model. (C) 2003 Elsevier Science B.V. All rights reserved. |
| 536 | _ | _ | |a Photovoltaik |c E02 |2 G:(DE-HGF) |0 G:(DE-Juel1)FUEK247 |x 0 |
| 588 | _ | _ | |a Dataset connected to Web of Science |
| 650 | _ | 7 | |a J |2 WoSType |
| 653 | 2 | 0 | |2 Author |a etching |
| 653 | 2 | 0 | |2 Author |a sputtering |
| 653 | 2 | 0 | |2 Author |a surface morphology |
| 653 | 2 | 0 | |2 Author |a zinc oxide |
| 700 | 1 | _ | |a Schöpe, G. |b 1 |u FZJ |0 P:(DE-Juel1)VDB5938 |
| 700 | 1 | _ | |a Hüpkes, J. |b 2 |u FZJ |0 P:(DE-Juel1)130252 |
| 700 | 1 | _ | |a Agashe, Ch. |b 3 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Müller, J. |b 4 |u FZJ |0 P:(DE-Juel1)VDB2892 |
| 700 | 1 | _ | |a Rech, B. |b 5 |u FZJ |0 P:(DE-Juel1)VDB5941 |
| 773 | _ | _ | |a 10.1016/S0040-6090(03)00949-0 |g Vol. 442, p. 80 - 85 |p 80 - 85 |q 442<80 - 85 |0 PERI:(DE-600)1482896-0 |t Thin solid films |v 442 |y 2003 |x 0040-6090 |
| 856 | 7 | _ | |u http://dx.doi.org/10.1016/S0040-6090(03)00949-0 |
| 909 | C | O | |o oai:juser.fz-juelich.de:33962 |p VDB |
| 913 | 1 | _ | |k E02 |v Photovoltaik |l Erneuerbare Energien |b Energie |0 G:(DE-Juel1)FUEK247 |x 0 |
| 914 | 1 | _ | |a Nachtrag |y 2003 |
| 915 | _ | _ | |0 StatID:(DE-HGF)0010 |a JCR/ISI refereed |
| 920 | 1 | _ | |k IPV |l Institut für Photovoltaik |d 31.12.2006 |g IPV |0 I:(DE-Juel1)VDB46 |x 0 |
| 970 | _ | _ | |a VDB:(DE-Juel1)39107 |
| 980 | _ | _ | |a VDB |
| 980 | _ | _ | |a ConvertedRecord |
| 980 | _ | _ | |a journal |
| 980 | _ | _ | |a I:(DE-Juel1)IEK-5-20101013 |
| 980 | _ | _ | |a UNRESTRICTED |
| 981 | _ | _ | |a I:(DE-Juel1)IMD-3-20101013 |
| 981 | _ | _ | |a I:(DE-Juel1)IEK-5-20101013 |
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