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@ARTICLE{Lookman:35410,
author = {Lookman, I. V. and Bowman, R. M. and Gregg, J. M. and Kut,
J. and Rios, S. and Dawber, M. and Rüdiger, A. and Scott,
J. F.},
title = {{T}hickness independence of true phase transition
temperatures in barium strontium titanate films},
journal = {Journal of applied physics},
volume = {96},
issn = {0021-8979},
address = {Melville, NY},
publisher = {American Institute of Physics},
reportid = {PreJuSER-35410},
pages = {555 - 562},
year = {2004},
note = {Record converted from VDB: 12.11.2012},
abstract = {The functional properties of two types of barium strontium
titanate (BST) thin film capacitor structures were studied:
one set of structures was made using pulsed-laser deposition
(PLD) and the other using chemical solution deposition.
While initial observations on PLD films looking at the
behavior of T-m (the temperature at which the maximum
dielectric constant was observed) and T-c(*) (from
Curie-Weiss analysis) suggested that the
paraelectric-ferroelectric phase transition was
progressively depressed in temperature as BST film thickness
was reduced, further work suggested that this was not the
case. Rather, it appears that the temperatures at which
phase transitions occur in the thin films are independent of
film thickness. Further, the fact that in many cases three
transitions are observable, suggests that the sequence of
symmetry transitions that occur in the thin films are the
same as in bulk single crystals. This new observation could
have implications for the validity of the theoretically
produced thin film phase diagrams derived by Pertsev [Phys.
Rev. Lett. 80, 1988 (1998)] and extended by Ban and Alpay
[J. Appl. Phys. 91, 9288 (2002)]. In addition, the fact that
T-m measured for virgin films does not correlate well with
the inherent phase transition behavior, suggests that the
use of T-m alone to infer information about the
thermodynamics of thin film capacitor behavior, may not be
sufficient. (C) 2004 American Institute of Physics.},
keywords = {J (WoSType)},
cin = {IFF-IEM / CNI},
ddc = {530},
cid = {I:(DE-Juel1)VDB321 / I:(DE-Juel1)VDB381},
pnm = {Materialien, Prozesse und Bauelemente für die Mikro- und
Nanoelektronik},
pid = {G:(DE-Juel1)FUEK252},
shelfmark = {Physics, Applied},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000222093300089},
doi = {10.1063/1.1759084},
url = {https://juser.fz-juelich.de/record/35410},
}