001     36405
005     20200610184649.0
024 7 _ |2 ISSN
|a 0944-2952
024 7 _ |2 Handle
|a 2128/4428
037 _ _ |a PreJuSER-36405
041 _ _ |a German
082 _ _ |a 500
088 1 _ |a Juel-3628
088 _ _ |a Juel-3628
|2 JUEL
100 1 _ |0 P:(DE-Juel1)VDB7045
|a Thönissen, M.
|b 0
|e Corresponding author
|u FZJ
245 _ _ |a Spektroskopische Charakterisierung von Schichten und Schichtsystemen aus porösem Silicium im Hinblick auf optische und optoelektronische Anwendungen
260 _ _ |a Jülich
|b Forschungszentrum, Zentralbibliothek
|c 1999
336 7 _ |0 PUB:(DE-HGF)11
|2 PUB:(DE-HGF)
|a Dissertation / PhD Thesis
336 7 _ |0 PUB:(DE-HGF)3
|2 PUB:(DE-HGF)
|a Book
336 7 _ |0 2
|2 EndNote
|a Thesis
336 7 _ |2 DRIVER
|a doctoralThesis
336 7 _ |2 BibTeX
|a PHDTHESIS
336 7 _ |2 DataCite
|a Output Types/Dissertation
336 7 _ |2 ORCID
|a DISSERTATION
490 0 _ |0 PERI:(DE-600)2414853-2
|8 12605
|a Berichte des Forschungszentrums Jülich
|v 3628
|x 0944-2952
500 _ _ |a Record converted from JUWEL: 18.07.2013
500 _ _ |a Record converted from VDB: 12.11.2012
502 _ _ |a Aachen, Techn. Hochsch., Diss., 1999
|b Dr. (FH)
|c Techn. Hochsch. Aachen
|d 1999
520 _ _ |a Investigations were made on both, single layers and layer systems of porous silicon, using optical spectroscopy, gravimetry, diffractrometry and topographic methods, and REM and TEM aswell. Main emphasis of the investigations was concentrated to the optimization of single layers and layer systems with a view to application and basic studies, aiming at an industrial applicability in optical and opto-electronic components. The results of the investigations presented here show new ways of applications by using porous silicon, e.g., electrically controllable filter structures on the basis of liquid crystals, diffraction gratings of porous silicon and spectral sensitive photodiodes.
536 _ _ |0 G:(DE-Juel1)FUEK307
|2 G:(DE-HGF)
|a ohne FE
|c ohne FE
|x 0
655 _ 7 |a Hochschulschrift
|x Dissertation (FH)
856 4 _ |u https://juser.fz-juelich.de/record/36405/files/J%C2%A9%C6%A1l_3628_Th%C2%A9%C5%93nissen.pdf
|y OpenAccess
909 C O |o oai:juser.fz-juelich.de:36405
|p openaire
|p open_access
|p VDB
|p driver
|p dnbdelivery
913 1 _ |0 G:(DE-Juel1)FUEK307
|b ohne FE
|k ohne FE
|l ohne FE
|v ohne FE
|x 0
914 1 _ |y 1999
915 _ _ |0 StatID:(DE-HGF)0510
|2 StatID
|a OpenAccess
920 1 _ |0 I:(DE-Juel1)ISI-20090406
|d 31.12.2000
|g ISI
|k ISI
|l Institut für Schicht- und Ionentechnik
|x 0
970 _ _ |a VDB:(DE-Juel1)44166
980 _ _ |a VDB
980 _ _ |a ConvertedRecord
980 _ _ |a phd
980 _ _ |a I:(DE-Juel1)ISI-20090406
980 _ _ |a UNRESTRICTED
980 _ _ |a JUWEL
980 _ _ |a FullTexts
980 1 _ |a FullTexts


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