Fabrication of nanometer Schottky-tunnel MOSFETs by a novel silicide nanopatterning method

Zhao, Q. T.; Mesters, S.; Kappius, L.; Mantl, S.

Contribution to a conference proceedings/Contribution to a book

Fabrication of nanometer Schottky-tunnel MOSFETs by a novel silicide nanopatterning method

Zhao, Q. T. ; Kappius, L.FZJ* ; Mesters, S. ; Mantl, S.FZJ*

1999

SPIE-Conference on In-line Methods Monitors for Process and Yield Improvement, which occured at the SPIE Microelectronic MAnufacturing Symposium : Santa Clara, CA, 22.-23.9.1999 / ed.: S. Ajuria ... - Bellingham, Wash., 1999. - (SPIE proceedings series ; 3884). - 0-8194-3481-7

Note: Record converted from VDB: 12.11.2012

Contributing Institute(s):

Institut für Schicht- und Ionentechnik (ISI)

Research Program(s):

Ionentechnik (29.87.0)

Appears in the scientific report 1999
Notes: Proceedings

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Document types > Presentations > Conference Presentations
Document types > Books > Books
Workflow collections > Public records
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Record created 2012-11-13, last modified 2017-06-01

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