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000037536 0247_ $$2DOI$$a10.1139/V04-118
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000037536 084__ $$2WoS$$aChemistry, Multidisciplinary
000037536 1001_ $$0P:(DE-Juel1)VDB35518$$aHan, B.$$b0$$uFZJ
000037536 245__ $$aIn situ - ATR-SEIRAS study of adsorption and phase formation of trimesic acid on Au(111-25nm) film electrodes
000037536 260__ $$aOttawa, Ont.$$bNRC Research Press$$c2004
000037536 300__ $$a1481 - 1494
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000037536 440_0 $$012942$$aCanadian Journal of Chemistry$$v82$$x0008-4042
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000037536 520__ $$aThe adsorption and phase formation of 3 mmol L-1 trimesic acid (TMA) on Au(111-25 nm) film electrodes in contact with aq. 0.1 mol L-1 HClO4 electrolyte have been investigated by in situ ATR-SEIRAS, cyclic voltammetry, chronoamperometry, and STM measurements. Depending on the applied electrode potential, TMA molecules assemble in three distinctly different 2D ordered adlayers. In the range 0.10 < E < 0.50 V, planar-oriented molecules form an open ring honeycomb pattern (phase I) stabilized by directional hydrogen bonds. Interfacial water molecules are being replaced. A close-packed, physisorbed adlayer II forms at higher potentials in the range 0.58 < E < 0.75 V. Further increase of the electrode potential causes an orientation change. An initially disordered phase transforms into an ordered, stripe-like chemisorbed adlayer III of perpendicularly oriented TMA molecules (0.90 < E < 1.20 V). One carboxylate group per molecule is bound to the electrode surface, while the two other protonated carboxyl groups are directed toward the electrolyte, and act as structure-determining components of a hydrogen-bonded molecular ladder network. Strongly hydrogen-bonded and isolated water species are co-adsorbed. The potential-induced formation of chemisorbed TMA proceeds in two steps: (i) orientation change from planar to a disordered tilted and (or) perpendicular phase IIIa (tau < 5 ms) according to a Langmuir-type kinetics; (ii) subsequently, the chemisorbed TMA molecules align into a highly ordered, stripe-like phase IIIb with co-adsorbed water species.
000037536 536__ $$0G:(DE-Juel1)FUEK252$$2G:(DE-HGF)$$aMaterialien, Prozesse und Bauelemente für die  Mikro- und Nanoelektronik$$cI01$$x0
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000037536 650_7 $$2WoSType$$aJ
000037536 65320 $$2Author$$aATR-SEIRAS
000037536 65320 $$2Author$$atrimesic acid
000037536 65320 $$2Author$$aAu(111)
000037536 65320 $$2Author$$asupramolecular assembly
000037536 7001_ $$0P:(DE-Juel1)VDB2436$$aLi, Z.$$b1$$uFZJ
000037536 7001_ $$0P:(DE-Juel1)VDB22265$$aPronkin, S.$$b2$$uFZJ
000037536 7001_ $$0P:(DE-Juel1)VDB9859$$aWandlowski, Th.$$b3$$uFZJ
000037536 773__ $$0PERI:(DE-600)1482256-8$$a10.1139/v04-118$$gVol. 82, p. 1481 - 1494$$p1481 - 1494$$q82<1481 - 1494$$tCanadian journal of chemistry$$v82$$x0008-4042$$y2004
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000037536 9141_ $$y2004
000037536 915__ $$0StatID:(DE-HGF)0010$$aJCR/ISI refereed
000037536 9201_ $$0I:(DE-Juel1)VDB43$$d31.12.2006$$gISG$$kISG-3$$lInstitut für Grenzflächen und Vakuumtechnologien$$x0
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