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@ARTICLE{Ohya:37991,
      author       = {Ohya, K. and Kawakami, R. and Tanabe, T. and Wada, M. and
                      Ohgo, T. and Philipps, V. and Pospieszczyk, A. and Schweer,
                      B. and Huber, A. and Rubel, M. and von Seggern, J. and Noda,
                      N.},
      title        = {{S}imulation study of carbon and tungsten deposition on
                      {W}/{C} twin test limiter in {TEXTOR}-94},
      journal      = {Journal of nuclear materials},
      volume       = {283-287},
      issn         = {0022-3115},
      address      = {Amsterdam [u.a.]},
      publisher    = {Elsevier Science},
      reportid     = {PreJuSER-37991},
      pages        = {1182 - 1186},
      year         = {2001},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {In order to investigate the impurity release and surface
                      modification on a W/C twin test limiter, made of a half of W
                      and the other half of C, exposed to the edge plasma of
                      TEXTOR-94, simulation calculations of ion-surface
                      interaction are conducted by a Monte Carlo code. According
                      to the calculations, experimentally observed spatial
                      distributions of WI and CII line intensities around the W
                      side of the limiter can be explained by physical sputtering
                      of W, reflection of bombarding C ions and physical
                      sputtering of implanted C. The CII line emission, resulting
                      from thermal C atoms, around the C side of the limiter is
                      suppressed by deposition of W, and the reflection of C ions
                      from W deposited on C causes the CII intensity to decay more
                      slowly than that from C without the deposition. Bombardment
                      with deuterium edge plasmas, containing impurity W, produces
                      a thick W layer on the C side of the limiter, whereas C
                      implanted in the W side is strongly sputtered due to impact
                      of most constituent D ions. (C) 2000 Elsevier Science B.V.
                      All rights reserved.},
      keywords     = {J (WoSType)},
      cin          = {IPP-1 / IPP-2},
      ddc          = {530},
      cid          = {I:(DE-Juel1)VDB27 / I:(DE-Juel1)VDB28},
      pnm          = {Wandkonditionierung und Plasma-Wand-Prozesse / Teilchen-
                      und Energietransport in der Plasmarandschicht /
                      Verunreinigungsquellen in Tokamaks},
      pid          = {G:(DE-Juel1)FUEK46 / G:(DE-Juel1)FUEK48 /
                      G:(DE-Juel1)FUEK47},
      shelfmark    = {Materials Science, Multidisciplinary / Nuclear Science $\&$
                      Technology / Mining $\&$ Mineral Processing},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000165877800092},
      doi          = {10.1016/S0022-3115(00)00172-0},
      url          = {https://juser.fz-juelich.de/record/37991},
}