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000038552 0247_ $$2DOI$$a10.1016/j.susc.2004.11.037
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000038552 084__ $$2WoS$$aChemistry, Physical
000038552 084__ $$2WoS$$aPhysics, Condensed Matter
000038552 1001_ $$0P:(DE-HGF)0$$aGarcia, S. G.$$b0
000038552 245__ $$aUnderpotential Deposition of Cd on Ag(111): An in situ STM study
000038552 260__ $$aAmsterdam$$bElsevier$$c2005
000038552 300__ $$a9 - 18
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000038552 520__ $$aThe kinetics and mechanism of Cd underpotential deposition (UPD) and involved surface alloy formation processes the system Ag(1 1 1)/Cd2+,SO42- are studied by means of combined electrochemical measurements and in situ scanning tunneling microscopy (STM). The results show that the UPD process starts with a formation of an expanded (diluted) adlayer with a superlattice structure Ag(1 1 1)-(root3- x root19)R23.4degrees. In the underpotential range 50 mV < DeltaE < 80 mV this adlayer transforms to a condensed close packed Cd monolayer via a first order phase transition. At long polarization times the condensed monolayer undergoes structural changes involving place exchange processes between Cd atoms and surface Ag atoms. A formation of a second Cd monolayer and a significant Ag-Cd surface alloying take place at lower underpotentials (DeltaE < 50 mV). The kinetics of surface alloying are analyzed on the basis of a recently proposed diffusion model including a relatively fast initial formation of a very thin surface alloy film and a subsequent slow alloy growth controlled by solid state diffusion. The anodic dealloying results in an appearance of monatornically deep pits, which disappear quickly at relatively high underpotentials (DeltaE > 550 mV) indicating a high mobility of surface Ag atoms. (C) 2004 Elsevier B.V. All rights reserved.
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000038552 65320 $$2Author$$aSTM
000038552 65320 $$2Author$$aunderpotential deposition
000038552 65320 $$2Author$$aalloy formation
000038552 65320 $$2Author$$acadmium
000038552 65320 $$2Author$$asilver
000038552 7001_ $$0P:(DE-HGF)0$$aSalinas, D. R.$$b1
000038552 7001_ $$0P:(DE-Juel1)VDB13645$$aStaikov, G.$$b2$$uFZJ
000038552 773__ $$0PERI:(DE-600)1479030-0$$a10.1016/j.susc.2004.11.037$$gVol. 576, p. 9 - 18$$p9 - 18$$q576<9 - 18$$tSurface science$$v576$$x0039-6028$$y2005
000038552 8567_ $$uhttp://dx.doi.org/10.1016/j.susc.2004.11.037
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000038552 9201_ $$0I:(DE-Juel1)VDB43$$d31.12.2006$$gISG$$kISG-3$$lInstitut für Grenzflächen und Vakuumtechnologien$$x0
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