001     3952
005     20190625110808.0
024 7 _ |2 DOI
|a 10.1016/j.tsf.2007.05.074
024 7 _ |2 WOS
|a WOS:000252980400056
024 7 _ |a altmetric:21801699
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037 _ _ |a PreJuSER-3952
041 _ _ |a eng
082 _ _ |a 070
084 _ _ |2 WoS
|a Materials Science, Multidisciplinary
084 _ _ |2 WoS
|a Materials Science, Coatings & Films
084 _ _ |2 WoS
|a Physics, Applied
084 _ _ |2 WoS
|a Physics, Condensed Matter
100 1 _ |a Bräuhaus, D.
|b 0
|0 P:(DE-HGF)0
245 _ _ |a Radiofrequency sputter deposition of germanium-sselenide thin films for resistive switching
260 _ _ |a Amsterdam [u.a.]
|b Elsevier
|c 2008
300 _ _ |a 1223 - 1226
336 7 _ |a Journal Article
|0 PUB:(DE-HGF)16
|2 PUB:(DE-HGF)
336 7 _ |a Output Types/Journal article
|2 DataCite
336 7 _ |a Journal Article
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336 7 _ |a ARTICLE
|2 BibTeX
336 7 _ |a JOURNAL_ARTICLE
|2 ORCID
336 7 _ |a article
|2 DRIVER
440 _ 0 |a Thin Solid Films
|x 0040-6090
|0 5762
|y 6
|v 516
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a The superionic conducting properties of Ag-doped GeSe thin films make this material a promising candidate for future, resistively switching-based memories allowing for high integration densities and short switching times. This paper reports on the radiofrequency sputter deposition of GeSe thin films and on the properties of the deposited thin films with respect to non-volatile memory applications. As sputter deposition is a widely used deposition method for industrial applications, we focused on the influences of deposition parameters as power and pressure to examine the suitability of sputter deposition for fabricating random access memories using GeSe-based resistive memory cells. Multiple characterization methods were utilized to determine the quality of the deposited thin films. The results of our measurements showed that we obtained smooth, dense and amorphous layers, which reveal good switching properties after doping with Ag, suitable for the use in GeSe-based memories. (C) 2007 Elsevier B.V. All rights reserved.
536 _ _ |a Grundlagen für zukünftige Informationstechnologien
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588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
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653 2 0 |2 Author
|a germanium-selenide
653 2 0 |2 Author
|a thin film
653 2 0 |2 Author
|a sputter deposition
653 2 0 |2 Author
|a resistive switching
653 2 0 |2 Author
|a memory application
700 1 _ |a Schindler, C.
|b 1
|u FZJ
|0 P:(DE-Juel1)VDB61376
700 1 _ |a Böttger, U.
|b 2
|0 P:(DE-HGF)0
700 1 _ |a Waser, R.
|b 3
|u FZJ
|0 P:(DE-Juel1)131022
773 _ _ |a 10.1016/j.tsf.2007.05.074
|g Vol. 516, p. 1223 - 1226
|p 1223 - 1226
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|0 PERI:(DE-600)1482896-0
|t Thin solid films
|v 516
|y 2008
|x 0040-6090
856 7 _ |u http://dx.doi.org/10.1016/j.tsf.2007.05.074
909 C O |o oai:juser.fz-juelich.de:3952
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914 1 _ |y 2008
915 _ _ |0 StatID:(DE-HGF)0010
|a JCR/ISI refereed
920 1 _ |d 31.12.2010
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|l Elektronische Materialien
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920 1 _ |0 I:(DE-82)080009_20140620
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|l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology
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920 1 _ |d 14.09.2008
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|l Center of Nanoelectronic Systems for Information Technology
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