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000039771 084__ $$2WoS$$aMaterials Science, Multidisciplinary
000039771 084__ $$2WoS$$aPhysics, Condensed Matter
000039771 1001_ $$0P:(DE-Juel1)VDB5680$$aDahmen, K.$$b0$$uFZJ
000039771 245__ $$aA finite element analysis of the bending of crystalline plates due to anisotropic surface and film stress applied to magnetoelasticity
000039771 260__ $$aAmsterdam$$bNorth-Holland Publ. Co.$$c2001
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000039771 440_0 $$03490$$aJournal of Magnetism and Magnetic Materials$$v231$$x0304-8853
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000039771 520__ $$aThe bending of crystalline plates in response to a non-isotropic stress on one of the two surfaces is investigated with special attention to magnetoelastic effects. The crystalline plates are assumed to have cubic symmetry, expose either (1 0 0) or (1 I I) surfaces, and be clamped along one edge. It is shown that the effect of clamping can be described by a dimensionless parameter, the "dimensionality" D, which in general depends on the length-to-width ratio of the sample, the Poisson ratio v, and the elastic anisotropy A. Using a finite element analysis we find that the dimensionality parameters for anisotropic and isotropic surface stresses are identical. The theory is applied to the bending caused by magnetoelastic stresses in deposited thin films. Expressions are derived to calculate the magnetoelastic coupling constants of films with cubic, tetragonal, or hexagonal symmetry from a measurement of the change of radius of curvature of the film-substrate composite upon an in-plane reorientation of the film magnetization. (C) 2001 Elsevier Science B.V. All rights reserved.
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000039771 65320 $$2Author$$asurface stress
000039771 65320 $$2Author$$amagnetoelastic coupling
000039771 7001_ $$0P:(DE-Juel1)VDB5414$$aIbach, H.$$b1$$uFZJ
000039771 7001_ $$0P:(DE-HGF)0$$aSander, D.$$b2
000039771 773__ $$0PERI:(DE-600)1479000-2$$a10.1016/S0304-8853(00)01392-5$$gVol. 231, p. 74$$p74$$q231<74$$tJournal of magnetism and magnetic materials$$v231$$x0304-8853$$y2001
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000039771 9141_ $$y2001
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000039771 9201_ $$0I:(DE-Juel1)VDB43$$d31.12.2006$$gISG$$kISG-3$$lInstitut für Grenzflächen und Vakuumtechnologien$$x0
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