Gast ::
| Hauptseite > Publikationsdatenbank > Separation of bulk and interface contributions to electroforming and resistive switching behavior of epitaxial Fe-doped SrTiO3 > print |
| Hauptseite > Publikationsdatenbank > Separation of bulk and interface contributions to electroforming and resistive switching behavior of epitaxial Fe-doped SrTiO3 > print |
| 001 | 3983 | ||
| 005 | 20200423202458.0 | ||
| 024 | 7 | _ | |a 10.1063/1.3100209 |2 DOI |
| 024 | 7 | _ | |a WOS:000264774000203 |2 WOS |
| 024 | 7 | _ | |a 2128/17262 |2 Handle |
| 037 | _ | _ | |a PreJuSER-3983 |
| 041 | _ | _ | |a eng |
| 082 | _ | _ | |a 530 |
| 084 | _ | _ | |2 WoS |a Physics, Applied |
| 100 | 1 | _ | |a Menke, T. |b 0 |u FZJ |0 P:(DE-Juel1)VDB67806 |
| 245 | _ | _ | |a Separation of bulk and interface contributions to electroforming and resistive switching behavior of epitaxial Fe-doped SrTiO3 |
| 260 | _ | _ | |a Melville, NY |b American Institute of Physics |c 2009 |
| 300 | _ | _ | |a 066104 |
| 336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a article |2 DRIVER |
| 440 | _ | 0 | |a Journal of Applied Physics |x 0021-8979 |0 3051 |y 6 |v 105 |
| 500 | _ | _ | |a We thank R. Muenstermann and K. Shibuya for helpful discussions and Intel Inc. for financial support. |
| 520 | _ | _ | |a We succeeded in the separation of bulk and interface contributions to the electroforming and resistive switching behavior of Pt/STO(Fe)/Nb:STO devices by performing impedance spectroscopy. Two distinctive features observed in the impedance spectra could be assigned to the STO(Fe) bulk and to the depletion layer of the Pt/STO(Fe) Schottky contact. We attribute the resistance change during the dc forming process to a local bypassing of the depletion layer caused by oxygen effusion to the environment. By comparing the impedance spectra in the resistive "on" and "off" states, we propose that the resistance of the STO(Fe)/Nb:STO interface locally changes during the switching process. |
| 536 | _ | _ | |a Grundlagen für zukünftige Informationstechnologien |c P42 |2 G:(DE-HGF) |0 G:(DE-Juel1)FUEK412 |x 0 |
| 588 | _ | _ | |a Dataset connected to Web of Science |
| 650 | _ | 7 | |a J |2 WoSType |
| 653 | 2 | 0 | |2 Author |a effusion |
| 653 | 2 | 0 | |2 Author |a electric impedance |
| 653 | 2 | 0 | |2 Author |a electroforming |
| 653 | 2 | 0 | |2 Author |a iron |
| 653 | 2 | 0 | |2 Author |a niobium |
| 653 | 2 | 0 | |2 Author |a platinum |
| 653 | 2 | 0 | |2 Author |a Schottky barriers |
| 653 | 2 | 0 | |2 Author |a strontium compounds |
| 653 | 2 | 0 | |2 Author |a switching |
| 700 | 1 | _ | |a Meuffels, P. |b 1 |u FZJ |0 P:(DE-Juel1)130836 |
| 700 | 1 | _ | |a Dittmann, R. |b 2 |u FZJ |0 P:(DE-Juel1)VDB5464 |
| 700 | 1 | _ | |a Szot, K. |b 3 |u FZJ |0 P:(DE-Juel1)VDB2799 |
| 700 | 1 | _ | |a Waser, R. |b 4 |u FZJ |0 P:(DE-Juel1)131022 |
| 773 | _ | _ | |a 10.1063/1.3100209 |g Vol. 105, p. 066104 |p 066104 |q 105<066104 |0 PERI:(DE-600)1476463-5 |t Journal of applied physics |v 105 |y 2009 |x 0021-8979 |
| 856 | 7 | _ | |u http://dx.doi.org/10.1063/1.3100209 |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/3983/files/1.3100209.pdf |y OpenAccess |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/3983/files/1.3100209.gif?subformat=icon |x icon |y OpenAccess |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/3983/files/1.3100209.jpg?subformat=icon-180 |x icon-180 |y OpenAccess |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/3983/files/1.3100209.jpg?subformat=icon-700 |x icon-700 |y OpenAccess |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/3983/files/1.3100209.pdf?subformat=pdfa |x pdfa |y OpenAccess |
| 909 | C | O | |o oai:juser.fz-juelich.de:3983 |p openaire |p open_access |p VDB |p driver |p dnbdelivery |
| 913 | 1 | _ | |k P42 |v Grundlagen für zukünftige Informationstechnologien |l Grundlagen für zukünftige Informationstechnologien (FIT) |b Schlüsseltechnologien |0 G:(DE-Juel1)FUEK412 |x 0 |
| 914 | 1 | _ | |y 2009 |
| 915 | _ | _ | |a OpenAccess |0 StatID:(DE-HGF)0510 |2 StatID |
| 915 | _ | _ | |a JCR/ISI refereed |0 StatID:(DE-HGF)0010 |
| 920 | 1 | _ | |d 31.12.2010 |g IFF |k IFF-6 |l Elektronische Materialien |0 I:(DE-Juel1)VDB786 |x 0 |
| 920 | 1 | _ | |0 I:(DE-82)080009_20140620 |k JARA-FIT |l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology |g JARA |x 1 |
| 970 | _ | _ | |a VDB:(DE-Juel1)110578 |
| 980 | _ | _ | |a VDB |
| 980 | _ | _ | |a ConvertedRecord |
| 980 | _ | _ | |a journal |
| 980 | _ | _ | |a I:(DE-Juel1)PGI-7-20110106 |
| 980 | _ | _ | |a I:(DE-82)080009_20140620 |
| 980 | _ | _ | |a UNRESTRICTED |
| 980 | 1 | _ | |a FullTexts |
| 981 | _ | _ | |a I:(DE-Juel1)PGI-7-20110106 |
| 981 | _ | _ | |a I:(DE-Juel1)VDB881 |
| Library | Collection | CLSMajor | CLSMinor | Language | Author |
|---|