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000039875 084__ $$2WoS$$aChemistry, Physical
000039875 084__ $$2WoS$$aPhysics, Condensed Matter
000039875 1001_ $$0P:(DE-Juel1)4744$$aGiesen, M.$$b0$$uFZJ
000039875 245__ $$aStep and island dynamics at solid/vacuum and solid/liquid interfaces
000039875 260__ $$aAmsterdam [u.a.]$$bElsevier$$c2001
000039875 300__ $$a1 - 154
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000039875 440_0 $$05148$$aProgress in Surface Science$$v86$$x0079-6816
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000039875 520__ $$aThe investigation of step and island dynamics on surfaces has enormously contributed to the microscopic understanding of mass transport processes in equilibrium, during growth and coarsening of surface structures. From the scaling behavior of step fluctuations as well as of the ripening of mono- and multilayer islands, the atomic diffusion processes may be unambiguously determined even when single atom motion cannot be observed directly. This is the case for metal surfaces at high temperatures and, in particular, for metal electrodes in electrochemical environment. In the case of the latter, the analysis of step and island dynamics is the only method available to date to learn about the dynamics at the solid/liquid interface on the atomic scale. Here, we review the basic theoretical principles and the experimental contributions on step and island dynamics performed in ultra-high vacuum as well as (more recently) in electrolyte. It focuses also on the comparison between experimental results obtained at the solid/vacuum and at the solid/liquid interface. (C) 2001 Elsevier Science Ltd. All rights reserved.
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000039875 65320 $$2Author$$astep dynamics
000039875 65320 $$2Author$$astep fluctuations
000039875 65320 $$2Author$$agrowth
000039875 65320 $$2Author$$aisland decay
000039875 65320 $$2Author$$aripening
000039875 65320 $$2Author$$acoarsening
000039875 65320 $$2Author$$astep-step interactions
000039875 65320 $$2Author$$adiffusion
000039875 65320 $$2Author$$ametal surfaces
000039875 65320 $$2Author$$ainterlayer mass transports
000039875 65320 $$2Author$$aintralayer mass transport
000039875 65320 $$2Author$$asolid/vacuum interface
000039875 65320 $$2Author$$ametal electrodes
000039875 65320 $$2Author$$asolid/liquid interface
000039875 773__ $$0PERI:(DE-600)1479024-5$$a10.1016/S0079-6816(00)00021-6$$gVol. 68, p. 1 - 154$$p1 - 154$$q68<1 - 154$$tProgress in surface science$$v68$$x0079-6816$$y2001
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000039875 9141_ $$aNachtrag$$y2001
000039875 915__ $$0StatID:(DE-HGF)0010$$aJCR/ISI refereed
000039875 9201_ $$0I:(DE-Juel1)VDB43$$d31.12.2006$$gISG$$kISG-3$$lInstitut für Grenzflächen und Vakuumtechnologien$$x0
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