| Hauptseite > Publikationsdatenbank > Vertical double-gate MOSFET based on epitaxial growth by LPCVD > RIS |
TY - CONF AU - Moers, J. AU - Trellenkamp, S. AU - Vescan, L. AU - Marso, M. AU - Kordos, P. AU - Lüth, H. TI - Vertical double-gate MOSFET based on epitaxial growth by LPCVD M1 - PreJuSER-40697 SN - 2-914601-01-8 PY - 2001 N1 - Record converted from VDB: 12.11.2012 LB - PUB:(DE-HGF)8 ; PUB:(DE-HGF)7 UR - https://juser.fz-juelich.de/record/40697 ER -