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000041010 0247_ $$2DOI$$a10.1016/j.apsusc.2004.11.082
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000041010 084__ $$2WoS$$aChemistry, Physical
000041010 084__ $$2WoS$$aMaterials Science, Coatings & Films
000041010 084__ $$2WoS$$aPhysics, Applied
000041010 084__ $$2WoS$$aPhysics, Condensed Matter
000041010 1001_ $$0P:(DE-Juel1)VDB34540$$aLüssem, B.$$b0$$uFZJ
000041010 245__ $$aThe origin of faceting of ultrafat gold films epitaxially grown on Mica
000041010 260__ $$aAmsterdam$$bNorth-Holland$$c2005
000041010 300__ $$a197 - 200
000041010 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article
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000041010 440_0 $$0573$$aApplied Surface Science$$v249$$x0169-4332
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000041010 520__ $$aA two-step deposition process for the formation of atomically flat gold films on mica is developed. The process starts with a high deposition rate followed by a 1:100 reduced rate. Using this combination a completely wetting of mica by gold resulting in a two-dimensional growth mode and finally extremely flat gold films with large terraces are achieved. Additionally hexagonal facefing of the gold films on mica is observed at moderate temperatures which can be related to the relaxation of stress caused by different thermal coefficients of expansion of mica and gold. The stress release leads to the generation of misfit dislocations that glide along the (100) planes producing facets on the surface. Annealing experiments in a UHV-STM and thermogravimetry point to the inset of intensified hexagonal faceting due to the starting decomposition of mica at elevated temperatures. (c) 2004 Elsevier B.V. All rights reserved.
000041010 536__ $$0G:(DE-Juel1)FUEK252$$2G:(DE-HGF)$$aMaterialien, Prozesse und Bauelemente für die  Mikro- und Nanoelektronik$$cI01$$x0
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000041010 65320 $$2Author$$agold on mica
000041010 65320 $$2Author$$afaceting
000041010 65320 $$2Author$$a2D growth
000041010 65320 $$2Author$$athermogravimetry
000041010 65320 $$2Author$$adislocation glide
000041010 7001_ $$0P:(DE-Juel1)130751$$aKarthäuser, S.$$b1$$uFZJ
000041010 7001_ $$0P:(DE-Juel1)VDB26000$$aHaselier, H.$$b2$$uFZJ
000041010 7001_ $$0P:(DE-Juel1)131022$$aWaser, R.$$b3$$uFZJ
000041010 773__ $$0PERI:(DE-600)2002520-8$$a10.1016/j.apsusc.2004.11.082$$gVol. 249, p. 197 - 200$$p197 - 200$$q249<197 - 200$$tApplied surface science$$v249$$x0169-4332$$y2005
000041010 8567_ $$uhttp://dx.doi.org/10.1016/j.apsusc.2004.11.082
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000041010 9141_ $$y2005
000041010 915__ $$0StatID:(DE-HGF)0010$$aJCR/ISI refereed
000041010 9201_ $$0I:(DE-Juel1)VDB381$$d14.09.2008$$gCNI$$kCNI$$lCenter of Nanoelectronic Systems for Information Technology$$x1$$z381
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