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@ARTICLE{Lssem:41010,
      author       = {Lüssem, B. and Karthäuser, S. and Haselier, H. and Waser,
                      R.},
      title        = {{T}he origin of faceting of ultrafat gold films epitaxially
                      grown on {M}ica},
      journal      = {Applied surface science},
      volume       = {249},
      issn         = {0169-4332},
      address      = {Amsterdam},
      publisher    = {North-Holland},
      reportid     = {PreJuSER-41010},
      pages        = {197 - 200},
      year         = {2005},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {A two-step deposition process for the formation of
                      atomically flat gold films on mica is developed. The process
                      starts with a high deposition rate followed by a 1:100
                      reduced rate. Using this combination a completely wetting of
                      mica by gold resulting in a two-dimensional growth mode and
                      finally extremely flat gold films with large terraces are
                      achieved. Additionally hexagonal facefing of the gold films
                      on mica is observed at moderate temperatures which can be
                      related to the relaxation of stress caused by different
                      thermal coefficients of expansion of mica and gold. The
                      stress release leads to the generation of misfit
                      dislocations that glide along the (100) planes producing
                      facets on the surface. Annealing experiments in a UHV-STM
                      and thermogravimetry point to the inset of intensified
                      hexagonal faceting due to the starting decomposition of mica
                      at elevated temperatures. (c) 2004 Elsevier B.V. All rights
                      reserved.},
      keywords     = {J (WoSType)},
      cin          = {CNI / IFF-IEM},
      ddc          = {670},
      cid          = {I:(DE-Juel1)VDB381 / I:(DE-Juel1)VDB321},
      pnm          = {Materialien, Prozesse und Bauelemente für die Mikro- und
                      Nanoelektronik},
      pid          = {G:(DE-Juel1)FUEK252},
      shelfmark    = {Chemistry, Physical / Materials Science, Coatings $\&$
                      Films / Physics, Applied / Physics, Condensed Matter},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000230607800027},
      doi          = {10.1016/j.apsusc.2004.11.082},
      url          = {https://juser.fz-juelich.de/record/41010},
}