%0 Journal Article
%A Bhakta, R.
%A Thomas, R.
%A Hipler, F.
%A Bettinger, H.
%A Müller, J.
%A Ehrhart, P.
%A Devi, A.
%T MOCVD of TiO2 thin films and studies on the nature of molecular mechanisms involved in the decomposition of [Ti(OPri)2(tbaoac)2]
%J Journal of materials chemistry
%V 14
%@ 0959-9428
%C London
%I ChemSoc
%M PreJuSER-41145
%P 3231 - 3238
%D 2004
%Z Record converted from VDB: 12.11.2012
%X A tailored precursor namely bis(isopropoxy)bis(tert-butylacetoacetato)titanium [Ti(OPri)(2)(tbaoac)(2)] was developed which showed good promise for depositing TiO2 thin films at reduced substrate temperatures compared to [Ti(OPri)(2)(thd)(2)]. Uniform films with high growth rates (similar to10 nm min(-1)) and lower surface roughness (<2 nm) were obtained on SiOx/Si and Pt/ZrOx/SiOx/Si substrates. Electrical properties of the films on Si substrates were studied and lowest equivalent oxide thickness (EOT) was around 2 nm and anatase phase had a dielectric constant around 40. A study on the thermolysis behaviour of [Ti(OPri)(2)(tbaoac)(2)] was carried out using matrix-isolation FTIR spectroscopy, to understand the mechanistic details of its thermal decomposition. It was found that the decomposition takes place by the formation of ketene intermediates.
%K J (WoSType)
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000224735700021
%R 10.1039/b405963h
%U https://juser.fz-juelich.de/record/41145