TY  - JOUR
AU  - Bhakta, R.
AU  - Thomas, R.
AU  - Hipler, F.
AU  - Bettinger, H.
AU  - Müller, J.
AU  - Ehrhart, P.
AU  - Devi, A.
TI  - MOCVD of TiO2 thin films and studies on the nature of molecular mechanisms involved in the decomposition of [Ti(OPri)2(tbaoac)2]
JO  - Journal of materials chemistry
VL  - 14
SN  - 0959-9428
CY  - London
PB  - ChemSoc
M1  - PreJuSER-41145
SP  - 3231 - 3238
PY  - 2004
N1  - Record converted from VDB: 12.11.2012
AB  - A tailored precursor namely bis(isopropoxy)bis(tert-butylacetoacetato)titanium [Ti(OPri)(2)(tbaoac)(2)] was developed which showed good promise for depositing TiO2 thin films at reduced substrate temperatures compared to [Ti(OPri)(2)(thd)(2)]. Uniform films with high growth rates (similar to10 nm min(-1)) and lower surface roughness (<2 nm) were obtained on SiOx/Si and Pt/ZrOx/SiOx/Si substrates. Electrical properties of the films on Si substrates were studied and lowest equivalent oxide thickness (EOT) was around 2 nm and anatase phase had a dielectric constant around 40. A study on the thermolysis behaviour of [Ti(OPri)(2)(tbaoac)(2)] was carried out using matrix-isolation FTIR spectroscopy, to understand the mechanistic details of its thermal decomposition. It was found that the decomposition takes place by the formation of ketene intermediates.
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000224735700021
DO  - DOI:10.1039/b405963h
UR  - https://juser.fz-juelich.de/record/41145
ER  -