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@ARTICLE{Bhakta:41145,
      author       = {Bhakta, R. and Thomas, R. and Hipler, F. and Bettinger, H.
                      and Müller, J. and Ehrhart, P. and Devi, A.},
      title        = {{MOCVD} of {T}i{O}2 thin films and studies on the nature of
                      molecular mechanisms involved in the decomposition of
                      [{T}i({OP}ri)2(tbaoac)2]},
      journal      = {Journal of materials chemistry},
      volume       = {14},
      issn         = {0959-9428},
      address      = {London},
      publisher    = {ChemSoc},
      reportid     = {PreJuSER-41145},
      pages        = {3231 - 3238},
      year         = {2004},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {A tailored precursor namely
                      bis(isopropoxy)bis(tert-butylacetoacetato)titanium
                      [Ti(OPri)(2)(tbaoac)(2)] was developed which showed good
                      promise for depositing TiO2 thin films at reduced substrate
                      temperatures compared to [Ti(OPri)(2)(thd)(2)]. Uniform
                      films with high growth rates (similar to10 nm min(-1)) and
                      lower surface roughness (<2 nm) were obtained on SiOx/Si and
                      Pt/ZrOx/SiOx/Si substrates. Electrical properties of the
                      films on Si substrates were studied and lowest equivalent
                      oxide thickness (EOT) was around 2 nm and anatase phase had
                      a dielectric constant around 40. A study on the thermolysis
                      behaviour of [Ti(OPri)(2)(tbaoac)(2)] was carried out using
                      matrix-isolation FTIR spectroscopy, to understand the
                      mechanistic details of its thermal decomposition. It was
                      found that the decomposition takes place by the formation of
                      ketene intermediates.},
      keywords     = {J (WoSType)},
      cin          = {IFF-IEM / CNI},
      ddc          = {540},
      cid          = {I:(DE-Juel1)VDB321 / I:(DE-Juel1)VDB381},
      pnm          = {Materialien, Prozesse und Bauelemente für die Mikro- und
                      Nanoelektronik},
      pid          = {G:(DE-Juel1)FUEK252},
      shelfmark    = {Chemistry, Physical / Materials Science, Multidisciplinary},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000224735700021},
      doi          = {10.1039/b405963h},
      url          = {https://juser.fz-juelich.de/record/41145},
}