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| Hauptseite > Publikationsdatenbank > Mononuclear precursor for MOCVD of HfO2 thin films > print |
| 001 | 41146 | ||
| 005 | 20200423203908.0 | ||
| 024 | 7 | _ | |a pmid:15263942 |2 pmid |
| 024 | 7 | _ | |a 10.1039/b405015k |2 DOI |
| 024 | 7 | _ | |a WOS:000223241000019 |2 WOS |
| 024 | 7 | _ | |a 2128/994 |2 Handle |
| 024 | 7 | _ | |2 Handle |a 2128/2881 |
| 037 | _ | _ | |a PreJuSER-41146 |
| 041 | _ | _ | |a eng |
| 082 | _ | _ | |a 540 |
| 084 | _ | _ | |2 WoS |a Chemistry, Multidisciplinary |
| 100 | 1 | _ | |a Baunemann, A. |b 0 |0 P:(DE-HGF)0 |
| 245 | _ | _ | |a Mononuclear precursor for MOCVD of HfO2 thin films |
| 260 | _ | _ | |a Cambridge |b Soc. |c 2004 |
| 300 | _ | _ | |a 1610 - 1611 |
| 336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a article |2 DRIVER |
| 440 | _ | 0 | |a Chemical Communications |x 1359-7345 |0 1184 |y 14 |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 520 | _ | _ | |a We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf(O(i)Pr)2(tbaoac)2] and its application towards MOCVD of HfO2 thin films in a production tool CVD reactor. |
| 536 | _ | _ | |a Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik |c I01 |2 G:(DE-HGF) |0 G:(DE-Juel1)FUEK252 |x 0 |
| 588 | _ | _ | |a Dataset connected to Web of Science, Pubmed |
| 650 | _ | 7 | |a J |2 WoSType |
| 700 | 1 | _ | |a Becker, R. |b 1 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Winter, M. |b 2 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Fischer, R. A. |b 3 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Thomas, R. |b 4 |u FZJ |0 P:(DE-Juel1)VDB35139 |
| 700 | 1 | _ | |a Ehrhart, P. |b 5 |u FZJ |0 P:(DE-Juel1)VDB3072 |
| 700 | 1 | _ | |a Waser, R. |b 6 |u FZJ |0 P:(DE-Juel1)131022 |
| 700 | 1 | _ | |a Devi, A. |b 7 |0 P:(DE-HGF)0 |
| 773 | _ | _ | |a 10.1039/b405015k |g p. 1610 - 1611 |p 1610 - 1611 |q 1610 - 1611 |0 PERI:(DE-600)1472881-3 |t Chemical communications |y 2004 |x 1359-7345 |
| 856 | 7 | _ | |u http://dx.doi.org/10.1039/b405015k |u http://hdl.handle.net/2128/994 |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/41146/files/56403.pdf |y OpenAccess |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/41146/files/56403.jpg?subformat=icon-1440 |x icon-1440 |y OpenAccess |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/41146/files/56403.jpg?subformat=icon-180 |x icon-180 |y OpenAccess |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/41146/files/56403.jpg?subformat=icon-640 |x icon-640 |y OpenAccess |
| 909 | C | O | |o oai:juser.fz-juelich.de:41146 |p openaire |p open_access |p driver |p VDB |p dnbdelivery |
| 913 | 1 | _ | |k I01 |v Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik |l Informationstechnologie mit nanoelektronischen Systemen |b Information |0 G:(DE-Juel1)FUEK252 |x 0 |
| 914 | 1 | _ | |y 2004 |
| 915 | _ | _ | |0 StatID:(DE-HGF)0010 |a JCR/ISI refereed |
| 915 | _ | _ | |2 StatID |0 StatID:(DE-HGF)0510 |a OpenAccess |
| 920 | 1 | _ | |k CNI |l Center of Nanoelectronic Systems for Information Technology |d 14.09.2008 |g CNI |z 381 |0 I:(DE-Juel1)VDB381 |x 1 |
| 920 | 1 | _ | |k IFF-IEM |l Elektronische Materialien |d 31.12.2006 |g IFF |0 I:(DE-Juel1)VDB321 |x 0 |
| 970 | _ | _ | |a VDB:(DE-Juel1)56403 |
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| 980 | _ | _ | |a I:(DE-Juel1)PGI-7-20110106 |
| 980 | _ | _ | |a UNRESTRICTED |
| 980 | _ | _ | |a FullTexts |
| 980 | 1 | _ | |a FullTexts |
| 981 | _ | _ | |a I:(DE-Juel1)PGI-7-20110106 |
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