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000041884 1001_ $$0P:(DE-Juel1)VDB41360$$aLinke, Felix$$b0$$eCorresponding author$$gmale$$uFZJ
000041884 245__ $$aDevelopment of Ellipsometric Microscopy as a Quantitative High-Resolution Technique for the Investigation of Thin Films at Glass-Water and Silicon-Air Interfaces
000041884 260__ $$aJülich$$bForschungszentrum Jülich Gmbh Zentralbibliothek, Verlag$$c2004
000041884 300__ $$a133 S.
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000041884 4900_ $$0PERI:(DE-600)2415627-9$$818205$$aSchriften des Forschungszentrums Jülich. Reihe Materie und Material/Matter and Materials$$v23
000041884 502__ $$aTechnische Universität München, Diss., 2004$$bDr. (Univ.)$$cTechnische Universität München$$d2004
000041884 500__ $$aRecord converted from VDB: 12.11.2012
000041884 520__ $$aThe presented work deals with ellipsometric microscopy, an optical technique for the investigation of thin films. Ellipsometric microscopy combines two powerful optical techniques, microscopy and ellipsometry. The latter technique exploits the fact that the state of polarization of light changes in a well known way upon reflection at interfaces covered by thin films. Ellipsometry is a very accurate technique for simultaneously measuring thin film thickness and refractive index or extinction coefficient. Its main drawback is poor lateral resolution which is overcome in ellipsometric microscopy. The basic idea of ellipsometric microscopy had been proposed before and its feasibility was shown. The aims of this thesis were twofold. On the one hand, ellipsometric microscopy was to be converted from a qualitative technique into a reliable and quantitative method. On the other hand, the technique had to be improved to a point were the glass-water interface could be investigated for biophysical questions. These goals proved to be very demanding because interpreting ellipsometric data requires an exact control over the angle of incidence and the polarization of light. However, in microscopy it is necessary to use cones of light with opening angles as large as possible. Finding the best balance between these conflicting demands and interpreting the ellipsometric data accurately required careful theoretical analysis and very substantial improvements of the setup. The former setup was converted into a fully-fledged ellipsometric device. All optical and optoelectronic parts and most opto-mechanical parts of the setup were changed and optimized for the specific demands of the technique. Moreover, approaches for accurate alignment and calibration known from ellipsometry were adapted to ellipsometric microscopy. Zone averaging was implemented for systematic cancellation of remaining experimental uncertainties to first order. In order to enable quantitative experiments it was important to analyze and correct imperfections of the utilized CCD camera. However, the most important issue was to correct for the influence of the imaging optics on the ellipsometric data. This was solved by describing the optical components as part of the sample, i.e. they were modeled to contribute their own ellipsometric angles $\Delta$ and $\Psi$. The validity of this model and the performance of the improved setup were verified experimentally in the full domain of the ellipsometric angles $\Psi \in$ [0$^{\circ}$,90$^{\circ}$[ and $\Delta \in$ [0$^{\circ}$,360$^{\circ}$[ by systematic measurements on calibrated objects . These were silicon substrates coated with carefully controlled thin layers of MgF$_{2}$ and ZnS . To the best of my knowledge neither this nor any other approach for correcting the influence of the imaging optics on the ellipsometric data was described before. [...]
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