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@PHDTHESIS{Linke:41884,
author = {Linke, Felix},
title = {{D}evelopment of {E}llipsometric {M}icroscopy as a
{Q}uantitative {H}igh-{R}esolution {T}echnique for the
{I}nvestigation of {T}hin {F}ilms at {G}lass-{W}ater and
{S}ilicon-{A}ir {I}nterfaces},
volume = {23},
school = {Technische Universität München},
type = {Dr. (Univ.)},
address = {Jülich},
publisher = {Forschungszentrum Jülich Gmbh Zentralbibliothek, Verlag},
reportid = {PreJuSER-41884},
isbn = {3-89336-373-4},
series = {Schriften des Forschungszentrums Jülich. Reihe Materie und
Material/Matter and Materials},
pages = {133 S.},
year = {2004},
note = {Record converted from VDB: 12.11.2012; Technische
Universität München, Diss., 2004},
abstract = {The presented work deals with ellipsometric microscopy, an
optical technique for the investigation of thin films.
Ellipsometric microscopy combines two powerful optical
techniques, microscopy and ellipsometry. The latter
technique exploits the fact that the state of polarization
of light changes in a well known way upon reflection at
interfaces covered by thin films. Ellipsometry is a very
accurate technique for simultaneously measuring thin film
thickness and refractive index or extinction coefficient.
Its main drawback is poor lateral resolution which is
overcome in ellipsometric microscopy. The basic idea of
ellipsometric microscopy had been proposed before and its
feasibility was shown. The aims of this thesis were twofold.
On the one hand, ellipsometric microscopy was to be
converted from a qualitative technique into a reliable and
quantitative method. On the other hand, the technique had to
be improved to a point were the glass-water interface could
be investigated for biophysical questions. These goals
proved to be very demanding because interpreting
ellipsometric data requires an exact control over the angle
of incidence and the polarization of light. However, in
microscopy it is necessary to use cones of light with
opening angles as large as possible. Finding the best
balance between these conflicting demands and interpreting
the ellipsometric data accurately required careful
theoretical analysis and very substantial improvements of
the setup. The former setup was converted into a
fully-fledged ellipsometric device. All optical and
optoelectronic parts and most opto-mechanical parts of the
setup were changed and optimized for the specific demands of
the technique. Moreover, approaches for accurate alignment
and calibration known from ellipsometry were adapted to
ellipsometric microscopy. Zone averaging was implemented for
systematic cancellation of remaining experimental
uncertainties to first order. In order to enable
quantitative experiments it was important to analyze and
correct imperfections of the utilized CCD camera. However,
the most important issue was to correct for the influence of
the imaging optics on the ellipsometric data. This was
solved by describing the optical components as part of the
sample, i.e. they were modeled to contribute their own
ellipsometric angles $\Delta$ and $\Psi$. The validity of
this model and the performance of the improved setup were
verified experimentally in the full domain of the
ellipsometric angles $\Psi \in$ [0$^{\circ}$,90$^{\circ}$[
and $\Delta \in$ [0$^{\circ}$,360$^{\circ}$[ by systematic
measurements on calibrated objects . These were silicon
substrates coated with carefully controlled thin layers of
MgF$_{2}$ and ZnS . To the best of my knowledge neither this
nor any other approach for correcting the influence of the
imaging optics on the ellipsometric data was described
before. [...]},
cin = {ISG-4},
ddc = {500},
cid = {I:(DE-Juel1)VDB44},
pnm = {Kondensierte Materie},
pid = {G:(DE-Juel1)FUEK242},
typ = {PUB:(DE-HGF)11 / PUB:(DE-HGF)3},
url = {https://juser.fz-juelich.de/record/41884},
}