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@ARTICLE{Fujihara:43472,
      author       = {Fujihara, S. and Schneller, T. and Waser, R.},
      title        = {{I}nterfacial reactions and microstructure of {B}a{T}i{O}3
                      films prepared using fluorideprecursor method},
      journal      = {Applied surface science},
      volume       = {221},
      issn         = {0169-4332},
      address      = {Amsterdam},
      publisher    = {North-Holland},
      reportid     = {PreJuSER-43472},
      pages        = {178 - 183},
      year         = {2004},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {Interfacial reactions of BaF2 and TiO2 were investigated in
                      preparing BaTiO3 thin films using a fluoride precursor
                      method. Trifluoroacetate solutions were prepared from barium
                      acetate, titanium tetraisopropoxide (TTIP), and
                      trifluoroacetic acid (TFA, CF3COOH) with additives such as
                      water and acetylacetone. The solutions were deposited on
                      platinized Si wafers by spin-coating, were pyrolysed at 400
                      degreesC in air and were finally heated typically at 700
                      degreesC in a water vapor atmosphere. The perovskite BaTiO3
                      phase was obtained although a small portion of BaF2 remained
                      unreacted. Thus, the films were characterized as the mixture
                      of BaTiO3, BaF2, and amorphous TiO2. Influence of the
                      solution chemistry on the phase evolution and microstructure
                      was examined in order to discuss the reaction pathway of the
                      perovskite phase. (C) 2003 Elsevier B.V. All rights
                      reserved.},
      keywords     = {J (WoSType)},
      cin          = {IFF-IEM},
      ddc          = {670},
      cid          = {I:(DE-Juel1)VDB321},
      pnm          = {Materialien, Prozesse und Bauelemente für die Mikro- und
                      Nanoelektronik},
      pid          = {G:(DE-Juel1)FUEK252},
      shelfmark    = {Chemistry, Physical / Materials Science, Coatings $\&$
                      Films / Physics, Applied / Physics, Condensed Matter},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000187721700026},
      doi          = {10.1016/S0169-4332(03)00869-9},
      url          = {https://juser.fz-juelich.de/record/43472},
}