001     45392
005     20200423204109.0
017 _ _ |a This version is available at the following Publisher URL: http://rsi.aip.org
024 7 _ |a 10.1063/1.1878153
|2 DOI
024 7 _ |a WOS:000228362200049
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037 _ _ |a PreJuSER-45392
041 _ _ |a eng
082 _ _ |a 530
084 _ _ |2 WoS
|a Instruments & Instrumentation
084 _ _ |2 WoS
|a Physics, Applied
100 1 _ |a Peter, F.
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245 _ _ |a Comparison of in-plane and out-of-plane optical amplification in AFM measurements
260 _ _ |a [S.l.]
|b American Institute of Physics
|c 2005
300 _ _ |a 046101
336 7 _ |a Journal Article
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336 7 _ |a Journal Article
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336 7 _ |a ARTICLE
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336 7 _ |a JOURNAL_ARTICLE
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336 7 _ |a article
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440 _ 0 |a Review of Scientific Instruments
|x 0034-6748
|0 5309
|y 4
|v 76
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a The in-plane image of piezoresponse force microscopy (PFM) generally exhibits a higher resolution and less noise than the out-of-plane image. Geometrical considerations indicate that the optical in-plane amplification is approximate to 40 times larger than the out-of-plane amplification. We experimentally confirm this explanation in a dedicated setup. (C) American Institute of Physics.
536 _ _ |a Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
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700 1 _ |a Rüdiger, A.
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700 1 _ |a Waser, R.
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700 1 _ |a Szot, K.
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700 1 _ |a Reichenberg, B.
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773 _ _ |a 10.1063/1.1878153
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856 7 _ |u http://dx.doi.org/10.1063/1.1878153
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