TY  - JOUR
AU  - Linke, F.
AU  - Merkel, R.
TI  - Quantitative ellipsometric microscopy at the silicon-air interface
JO  - Review of scientific instruments
VL  - 76
SN  - 0034-6748
CY  - [S.l.]
PB  - American Institute of Physics
M1  - PreJuSER-45682
SP  - 063701
PY  - 2005
N1  - Record converted from VDB: 12.11.2012
AB  - Ellipsometric microscopy is a technique that combines the merits of ellipsometry and light microscopy, i.e., it allows noninvasive, label-free measurements of thin film thickness and refractive index at high lateral resolution. Here we give a detailed description of the technique including a complete calibration scheme and a model to correct for the instrumental polarization of the imaging optics. The performance of the instrument was studied experimentally. We found a lateral resolution of 1 mu m and an absolute height accuracy of 3 nm. The measured refractive indices were accurate to 2.3% and the height sensitivity of the instrument was smaller than 5 A. Another virtue of the instrument design besides its good performance is that it is in essence an extension of standard light microscopy and could be integrated into commercial microscopes. (c) 2005 American Institute of Physics.
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000229962000056
DO  - DOI:10.1063/1.1921547
UR  - https://juser.fz-juelich.de/record/45682
ER  -