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@ARTICLE{Linke:45682,
author = {Linke, F. and Merkel, R.},
title = {{Q}uantitative ellipsometric microscopy at the silicon-air
interface},
journal = {Review of scientific instruments},
volume = {76},
issn = {0034-6748},
address = {[S.l.]},
publisher = {American Institute of Physics},
reportid = {PreJuSER-45682},
pages = {063701},
year = {2005},
note = {Record converted from VDB: 12.11.2012},
abstract = {Ellipsometric microscopy is a technique that combines the
merits of ellipsometry and light microscopy, i.e., it allows
noninvasive, label-free measurements of thin film thickness
and refractive index at high lateral resolution. Here we
give a detailed description of the technique including a
complete calibration scheme and a model to correct for the
instrumental polarization of the imaging optics. The
performance of the instrument was studied experimentally. We
found a lateral resolution of 1 mu m and an absolute height
accuracy of 3 nm. The measured refractive indices were
accurate to $2.3\%$ and the height sensitivity of the
instrument was smaller than 5 A. Another virtue of the
instrument design besides its good performance is that it is
in essence an extension of standard light microscopy and
could be integrated into commercial microscopes. (c) 2005
American Institute of Physics.},
keywords = {J (WoSType)},
cin = {ISG-4},
ddc = {530},
cid = {I:(DE-Juel1)VDB44},
pnm = {Kondensierte Materie},
pid = {G:(DE-Juel1)FUEK242},
shelfmark = {Instruments $\&$ Instrumentation / Physics, Applied},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000229962000056},
doi = {10.1063/1.1921547},
url = {https://juser.fz-juelich.de/record/45682},
}