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000047039 0247_ $$2DOI$$a10.1103/PhysRevB.72.064503
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000047039 084__ $$2WoS$$aPhysics, Condensed Matter
000047039 1001_ $$0P:(DE-HGF)0$$aGubin, A. I.$$b0
000047039 245__ $$aDependence of magnetic penetration depth on the thickness of superconducting Nb thin film
000047039 260__ $$aCollege Park, Md.$$bAPS$$c2005
000047039 300__ $$a064503
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000047039 440_0 $$04919$$aPhysical Review B$$v72$$x1098-0121
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000047039 520__ $$aIn this paper we present the results of a systematic study on the magnetic field penetration depth of superconducting niobium thin films. The films of thicknesses ranging from 8 to 300 nm were deposited on a Si substrate by dc magnetron sputtering. The values of the penetration depth lambda(0) were obtained from the measurements of the effective microwave surface impedance by employing a sapphire resonator technique. Additionally, for the films of thickness smaller than 20 nm, the absolute values of lambda(0) were determined by a microwave transmission method. We found that the reduction of the film thickness below 50 nm leads to a significant increase of the magnetic field penetration depth from about 80 nm for 300 nm thick film up to 230 nm for a 8 nm thick film. The dependence of the penetration depth on film thickness is described well by taking into account the experimental dependences of the critical temperature and residual resistivity on the thickness of the niobium films. Structural disordering of the films and suppression of superconductivity due to the proximity effect are considered as mechanisms responsible for the increase of the penetration depth in ultrathin films.
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000047039 7001_ $$0P:(DE-HGF)0$$aIl'in, K. S.$$b1
000047039 7001_ $$0P:(DE-Juel1)128738$$aVitusevich, S. A.$$b2$$uFZJ
000047039 7001_ $$0P:(DE-HGF)0$$aSiegel, M.$$b3
000047039 7001_ $$0P:(DE-Juel1)VDB5428$$aKlein, N.$$b4$$uFZJ
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000047039 8567_ $$uhttp://hdl.handle.net/2128/2118$$uhttp://dx.doi.org/10.1103/PhysRevB.72.064503
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