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@ARTICLE{Han:47542,
      author       = {Han, Y. and Mayer, D. and Offenhäusser, A. and Ingebrandt,
                      S.},
      title        = {{S}urface activation of thin silicon oxides by wet cleaning
                      and silanization},
      journal      = {Thin solid films},
      volume       = {510},
      issn         = {0040-6090},
      address      = {Amsterdam [u.a.]},
      publisher    = {Elsevier},
      reportid     = {PreJuSER-47542},
      pages        = {175 - 180},
      year         = {2006},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {Silanization protocols for glass slides and silicon oxide
                      substrates usually include acid rinsing steps to activate
                      the surfaces prior to silanization. In our group,
                      field-effect transistor devices and
                      electrolyte-insulator-semiconductor structures are used to
                      electronically record signals from cells or to detect
                      biomolecular interactions at the solid-liquid interface. A
                      miniaturized, high sensitive, field-effect-based
                      semiconductor device should expose at its input stage just a
                      thin oxide (< 10 nm) to the electrolyte solution. Therefore,
                      silanization protocols are needed, which do not alter the
                      thin oxide layers in terms of topology changes or thickness
                      loss. In this article we evaluated different protocols for
                      wet cleaning and activation of thin silicon oxides. The
                      efficiency of the cleaning methods was verified with Contact
                      Angle Measurements, Atomic Force Microscopy, and
                      Fourier-Transform Infrared Spectroscopy. Furthermore, X-ray
                      Photoelectron Spectroscopy was used to characterize the
                      oxides after the cleaning and silanization procedures.
                      (3-aminopropyl)triethoxysilane was used to functionalize the
                      oxide surfaces for further attachment of biological
                      molecules (e.g. proteins, DNA). Thicknesses and uniformity
                      of the silane coatings were evaluated by Imaging
                      Ellipsometry. (c) 2005 Elsevier B.V. All rights reserved.},
      keywords     = {J (WoSType)},
      cin          = {CNI / ISG-2 / JARA-FIT},
      ddc          = {070},
      cid          = {I:(DE-Juel1)VDB381 / I:(DE-Juel1)VDB42 /
                      $I:(DE-82)080009_20140620$},
      pnm          = {Grundlagen für zukünftige Informationstechnologien},
      pid          = {G:(DE-Juel1)FUEK412},
      shelfmark    = {Materials Science, Multidisciplinary / Materials Science,
                      Coatings $\&$ Films / Physics, Applied / Physics, Condensed
                      Matter},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000238011200029},
      doi          = {10.1016/j.tsf.2005.11.048},
      url          = {https://juser.fz-juelich.de/record/47542},
}