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@ARTICLE{Persheyev:47552,
author = {Persheyev, S. K. and Smirnov, V. and O'Neill, K. A. and
Reynolds, S. and Rose, M. J.},
title = {{A}tmospheric adsorption effects in hot-wire
chemical-vapor-deposition microcrystalline silicon films
with different electrode configurations},
journal = {Semiconductors},
volume = {39},
issn = {1063-7826},
address = {Berlin},
publisher = {Springer Science + Business Media},
reportid = {PreJuSER-47552},
pages = {343 - 346},
year = {2005},
note = {Record converted from VDB: 12.11.2012},
abstract = {Hot-wire chemical-vapor-disposition (CVD) thin silicon
films are studied by means of dark conductivity, FTIR,
hydrogen evolution, and SEM surface characterization. Three
types of metastability are observed: (1) long term
irreversible degradation due to oxidization processes on the
film surface, (2) reversible degradation determined by
uncontrolled water and/or oxygen adsorption, and (3) a fast
field-switching effect in the film bulk. We propose that
this effect is associated with the morphology changes during
film growth and an electrical field induced by adsorbed
atmospheric components on the film surface. It is found that
metastable processes close to the film surface are stronger
than in the bulk. (c) 2005 Pleiades Publishing, Inc.},
keywords = {J (WoSType)},
cin = {IPV},
ddc = {530},
cid = {I:(DE-Juel1)VDB46},
pnm = {Photovoltaik},
pid = {G:(DE-Juel1)FUEK247},
shelfmark = {Physics, Condensed Matter},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000228012800015},
doi = {10.1134/1.1882798},
url = {https://juser.fz-juelich.de/record/47552},
}