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@ARTICLE{Kohlstedt:49730,
author = {Kohlstedt, H. and Pertsev, N. A. and Contreras, J. R. and
Waser, R.},
title = {{T}heoretical current-voltage characteristics of
ferroelectric tunnel junctions},
journal = {Physical review / B},
volume = {72},
number = {12},
issn = {1098-0121},
address = {College Park, Md.},
publisher = {APS},
reportid = {PreJuSER-49730},
pages = {125341},
year = {2005},
note = {Record converted from VDB: 12.11.2012},
abstract = {We present the concept of ferroelectric tunnel junctions
(FTJs). These junctions consist of two metal electrodes
separated by a nanometer-thick ferroelectric barrier. The
current-voltage characteristics of FTJs are analyzed under
the assumption that the direct electron tunneling represents
the dominant conduction mechanism. First, the influence of
converse piezoelectric effect inherent in ferroelectric
materials on the tunnel current is described. The
calculations show that the lattice strains of piezoelectric
origin modify the current-voltage relationship owing to
strain-induced changes of the barrier thickness, electron
effective mass, and position of the conduction-band edge.
Remarkably, the conductance minimum becomes shifted from
zero voltage due to the piezoelectric effect, and a
strain-related resistive switching takes place after the
polarization reversal in a ferroelectric barrier. Second, we
analyze the influence of an internal electric field arising
due to imperfect screening of polarization charges by
electrons in metal electrodes. It is shown that, for
asymmetric FTJs, this depolarizing-field effect also leads
to a considerable change of the barrier resistance after the
polarization reversal. However, the symmetry of the
resulting current-voltage loop is different from that
characteristic of the strain-related resistive switching.
The crossover from one to another type of the hysteretic
curve, which accompanies the increase of FTJ asymmetry, is
described taking into account both the strain and
depolarizing-field effects. It is noted that asymmetric FTJs
with dissimilar top and bottom electrodes are preferable for
the nonvolatile memory applications because of a larger
resistance on/off ratio.},
keywords = {J (WoSType)},
cin = {IFF-IEM / CNI},
ddc = {530},
cid = {I:(DE-Juel1)VDB321 / I:(DE-Juel1)VDB381},
pnm = {Materialien, Prozesse und Bauelemente für die Mikro- und
Nanoelektronik},
pid = {G:(DE-Juel1)FUEK252},
shelfmark = {Physics, Condensed Matter},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000232229400107},
doi = {10.1103/PhysRevB.72.125341},
url = {https://juser.fz-juelich.de/record/49730},
}