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@ARTICLE{Ellerkmann:49741,
author = {Ellerkmann, U. and Schorn, P. and Bolten, D. and Boettger,
U. and Waser, R. and Bruchhaus, R. and Yamakawa, K.},
title = {{I}nfluence of asymmetric oxide electrode structures on the
interface capacity and the failure mechanisms in {PZT} thin
films},
journal = {Integrated ferroelectrics},
volume = {52},
issn = {1058-4587},
address = {London [u.a.]},
publisher = {Taylor $\&$ Francis},
reportid = {PreJuSER-49741},
pages = {63},
year = {2003},
note = {Record converted from VDB: 12.11.2012},
abstract = {The influence of symmetric and asymmetric electrodes
including SRO and IrO2 within the electrode structure on the
imprint and fatigue behavior in sputtered and CSD derived
PbZrxTi1-xO2 (PZT) thin films is investigated. It is found
that SRO buffer layers are needed within top and bottom
electrode to improve the fatigue behavior. However, for
improvement of the imprint behavior, only one SRO buffer
layer within either top or bottom electrode is sufficient,
whereas IrO2 reveals no improvement of the imprint behavior.
Furthermore the direction dependence of the imprint behavior
is examined. To examine the influence of the interface
capacity on the fatigue mechanism in more detail, the
capacity is measured for different PZT film thicknesses
during fatigue treatment. It is shown that there is hardly
any difference in interface capacity during fatigue.},
keywords = {J (WoSType)},
cin = {IFF-IEM / CNI},
ddc = {620},
cid = {I:(DE-Juel1)VDB321 / I:(DE-Juel1)VDB381},
pnm = {Materialien, Prozesse und Bauelemente für die Mikro- und
Nanoelektronik},
pid = {G:(DE-Juel1)FUEK252},
shelfmark = {Engineering, Electrical $\&$ Electronic / Physics, Applied
/ Physics, Condensed Matter},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000187624400008},
doi = {10.1080/10584580390254123},
url = {https://juser.fz-juelich.de/record/49741},
}