%0 Journal Article
%A Weides, M.
%A Tillmann, K.
%A Kohlstedt, H.
%T Fabrication of High Quality Ferromagnetic Josephson Junctions
%J Physica / C
%V 437-438
%@ 0921-4534
%C Amsterdam
%I North-Holland Physics Publ.
%M PreJuSER-51694
%P 349 - 352
%D 2006
%Z Record converted from VDB: 12.11.2012
%X We present ferromagnetic Nb/Al2O3/Ni60Cu40/Nb Josephson junctions (SIFS) with an ultrathin Al2O3 tunnel barrier. The junction fabrication was optimized regarding junction insulation and homogeneity of current transport. Using ion-beam-etching and anodic oxidation we defined and insulated the junction mesas. The additional 2 nm thin Cu-layer below the ferromagnetic NiCu (SINFS) lowered interface roughness and ensured very homogeneous current transport. A high yield of junctional devices with j(c) spreads less than 2% was obtained. (c) 2005 Elsevier B.V. All rights reserved.
%K J (WoSType)
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000238395700083
%R 10.1016/j.physc.2005.12.046
%U https://juser.fz-juelich.de/record/51694