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@ARTICLE{Weides:51694,
      author       = {Weides, M. and Tillmann, K. and Kohlstedt, H.},
      title        = {{F}abrication of {H}igh {Q}uality {F}erromagnetic
                      {J}osephson {J}unctions},
      journal      = {Physica / C},
      volume       = {437-438},
      issn         = {0921-4534},
      address      = {Amsterdam},
      publisher    = {North-Holland Physics Publ.},
      reportid     = {PreJuSER-51694},
      pages        = {349 - 352},
      year         = {2006},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {We present ferromagnetic Nb/Al2O3/Ni60Cu40/Nb Josephson
                      junctions (SIFS) with an ultrathin Al2O3 tunnel barrier. The
                      junction fabrication was optimized regarding junction
                      insulation and homogeneity of current transport. Using
                      ion-beam-etching and anodic oxidation we defined and
                      insulated the junction mesas. The additional 2 nm thin
                      Cu-layer below the ferromagnetic NiCu (SINFS) lowered
                      interface roughness and ensured very homogeneous current
                      transport. A high yield of junctional devices with j(c)
                      spreads less than $2\%$ was obtained. (c) 2005 Elsevier B.V.
                      All rights reserved.},
      keywords     = {J (WoSType)},
      cin          = {IFF-IEM / CNI / IFF-IMF},
      ddc          = {530},
      cid          = {I:(DE-Juel1)VDB321 / I:(DE-Juel1)VDB381 /
                      I:(DE-Juel1)VDB37},
      pnm          = {Grundlagen für zukünftige Informationstechnologien /
                      Kondensierte Materie},
      pid          = {G:(DE-Juel1)FUEK412 / G:(DE-Juel1)FUEK414},
      shelfmark    = {Physics, Applied},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000238395700083},
      doi          = {10.1016/j.physc.2005.12.046},
      url          = {https://juser.fz-juelich.de/record/51694},
}