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@ARTICLE{Chen:52764,
author = {Chen, Z. and Appenzeller, J. and Knoch, J. and Lin, Y. and
Avouris, P.},
title = {{T}he {R}ole of {M}etal-{N}anotube {C}ontact in the
{P}erformance of {C}arbon {N}anotube {F}ield-{E}ffect
{T}ransistors},
journal = {Nano letters},
volume = {5},
issn = {1530-6984},
address = {Washington, DC},
publisher = {ACS Publ.},
reportid = {PreJuSER-52764},
pages = {1497 - 1502},
year = {2005},
note = {Record converted from VDB: 12.11.2012},
abstract = {Single-wall carbon nanotube field-effect transistors
(CNFETs) have been shown to behave as Schottky barrier (SB)
devices. It is not clear, however, what factors control the
SB size. Here we present the first statistical analysis of
this issue. We show that a large data set of more than 100
devices can be consistently accounted by a model that
relates the on-current of a CNFET to a tunneling barrier
whose height is determined by the nanotube diameter and the
nature of the source/drain metal contacts. Our study permits
identification of the desired combination of tube diameter
and type of metal that provides the optimum performance of a
CNFET.},
keywords = {J (WoSType)},
cin = {ISG-1 / CNI},
ddc = {540},
cid = {I:(DE-Juel1)VDB41 / I:(DE-Juel1)VDB381},
pnm = {Materialien, Prozesse und Bauelemente für die Mikro- und
Nanoelektronik},
pid = {G:(DE-Juel1)FUEK252},
shelfmark = {Chemistry, Multidisciplinary / Chemistry, Physical /
Nanoscience $\&$ Nanotechnology / Materials Science,
Multidisciplinary / Physics, Applied / Physics, Condensed
Matter},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000230571300056},
doi = {10.1021/nl0508624},
url = {https://juser.fz-juelich.de/record/52764},
}